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公开(公告)号：WO2018132198A1
公开(公告)日：2018-07-19
申请号：PCT/US2017/064556
申请日：2017-12-04
Applicant: CYMER, LLC , ASML NETHERLANDS B.V.
Inventor： DUFFEY, Thomas Patrick , EVERTS, Frank , KING, Brian Edward , THORNES, Joshua Jon , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip
IPC: G03F7/20
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep -ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light, beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate with in a lithography exposure apparatus.
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公开(公告)号：WO2015187854A1
公开(公告)日：2015-12-10
申请号：PCT/US2015/034025
申请日：2015-06-03
Applicant: CYMER, LLC (A NEVADA COMPANY) , ASML NETHERLANDS B.V.
Inventor： DUFFEY, Thomas Patrick , GODFRIED, Herman Philip
IPC: G03F7/20
CPC classification number: G01J3/28 , G01J3/027 , G01J3/14 , G01J3/26 , G01J9/00 , G01J11/00 , G01J2003/2853 , G03F7/70041 , G03F7/70058 , G03F7/70575
Abstract: A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus, The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.
Abstract translation: 描述了一种用于估计由光源产生并指向光刻设备的晶片的脉冲光束的光谱特征的方法。该方法包括接收光束的脉冲的一组N个光谱; 将接收到的N光谱保存到保存的集合; 转换保存集中的光谱，形成一组变换光谱; 对变换的光谱进行平均以形成平均光谱; 以及基于所述平均光谱估计所述脉冲光束的光谱特征。
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公开(公告)号：WO2018102049A3
公开(公告)日：2018-06-07
申请号：PCT/US2017/057850
申请日：2017-10-23
Applicant: CYMER, LLC
Inventor： ZHAO, Zhong Quan , KING, Brian Edward , DUFFEY, Thomas Patrick
Abstract: A metrology system is used for measuring a spectral feature of a pulsed light beam. The metrology system includes: a beam homogenizer in the path of the pulsed light beam, the beam homogenizer having an array of wavefront modification cells, with each cell having a surface area that matches a size of at least one of the spatial modes of the light beam; an optical frequency separation apparatus in the path of the pulsed light beam exiting the beam homogenizer, wherein the optical frequency separation apparatus is configured to interact with the pulsed light beam and to output a plurality of spatial components that correspond to the spectral components of the pulsed light beam: and at least one sensor that receives and senses the output spatial components.
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4.发明申请
公开(公告)号：WO2018106379A1
公开(公告)日：2018-06-14
申请号：PCT/US2017/060312
申请日：2017-11-07
Applicant: CYMER, LLC
Inventor： AHLAWAT, Rahul , DUFFEY, Thomas Patrick
CPC classification number: H01S3/106 , G03F7/2006 , G03F7/70025 , G03F7/70575 , H01S3/08004 , H01S3/08009 , H01S3/10069 , H01S3/11 , H01S3/137
Abstract: Wafer positioning errors in stepper-scanners contribute to imaging defects. Changing the wavelength of the light source's generated light can compensate for wafer positional errors in the Z-direction. The wafer's real-time z-position is determined and a change in wavelength target to offset this error is communicated to the light source. The light source uses this change in wavelength target in a feed-forward operation and in an embodiment, in combination with existing feedback operations, on a pulse-by-pulse basis for subsequent pulses in a current burst of pulses in addition to receiving the newly-specified laser wavelength target for a subsequent burst of laser pulses.
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公开(公告)号：WO2020236647A1
公开(公告)日：2020-11-26
申请号：PCT/US2020/033262
申请日：2020-05-15
Applicant: CYMER, LLC
Inventor： GILLESPIE, Walter, Dale , THORNES, Joshua Jon , DUFFEY, Thomas Patrick , MASON, Eric, Anders , PAUDEL, Rabin
IPC: H01S3/23
Abstract: Apparatus for and method of generating multiple laser beams using multiple laser chambers. The relative timing of the beams is controllable so they may, for example, be interleaved, may overlap, or be prevented from overlapping, or may occur in rapid sequence. The beams may have different spectral and power characteristics such as different wavelengths. Also disclosed is a system in which at least one of the multiple laser chambers is configured to generate radiation of two different wavelengths.
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Patent Agency Ranking
公开(公告)号：WO2020236648A1
公开(公告)日：2020-11-26
申请号：PCT/US2020/033263
申请日：2020-05-15
Applicant: CYMER, LLC
Inventor： ZHAO, Yingbo , GILLESPIE, Walter, Dale , THORNES, Joshua Jon , DUFFEY, Thomas Patrick , MASON, Eric, Anders
IPC: H01S3/23
Abstract: A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.
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公开(公告)号：WO2020036736A1
公开(公告)日：2020-02-20
申请号：PCT/US2019/044327
申请日：2019-07-31
Applicant: CYMER, LLC
Inventor： BARNHART, Donald, Harrison , MASON, Eric, Anders , DUFFEY, Thomas Patrick , RAO, Rajasekhar, Madhava
Abstract: An optical apparatus includes: a pulse stretcher apparatus configured to receive an optical pulse of a pulsed light beam from a light source and to output a pulse cluster having a cluster width that is greater than the width of the received pulse, the pulse cluster being defined by a plurality of child pulses produced from the received pulse. The pulse stretcher apparatus comprises two or more optical circuits. The pulse stretcher apparatus is configured to produce each of the child pulses substantially displaced temporally from the other child pulses in the pulse cluster by at least a coherence time of the received pulse. The pulse cluster includes at least a set of three or more child pulses having peak intensities greater than a threshold level that is at least 80% of a peak intensity of a highest-intensity child pulse in the pulse cluster.
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公开(公告)号：WO2019014276A1
公开(公告)日：2019-01-17
申请号：PCT/US2018/041522
申请日：2018-07-10
Applicant: CYMER, LLC
Inventor： DUFFEY, Thomas Patrick
Abstract: Embodiments of the invention relate to apparatuses and methods for and method of measuring the concentration of F2 in the laser gas used in an excimer laser. In one or more embodiments, Quartz Enhanced Photoacoustic Spectroscopy is used to obtain a direct measurement of F2 concentration quickly and using only a small sample volume.
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公开(公告)号：WO2018102049A2
公开(公告)日：2018-06-07
申请号：PCT/US2017/057850
申请日：2017-10-23
Applicant: CYMER, LLC
Inventor： ZHAO, Zhong Quan , KING, Brian Edward , DUFFEY, Thomas Patrick
Abstract: A metrology system is used for measuring a spectral feature of a pulsed light beam. The metrology system includes: a beam homogenizer in the path of the pulsed light beam, the beam homogenizer having an array of wavefront modification cells, with each cell having a surface area that matches a size of at least one of the spatial modes of the light beam; an optical frequency separation apparatus in the path of the pulsed light beam exiting the beam homogenizer, wherein the optical frequency separation apparatus is configured to interact with the pulsed light beam and to output a plurality of spatial components that correspond to the spectral components of the pulsed light beam: and at least one sensor that receives and senses the output spatial components.
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公开(公告)号：WO2018013355A1
公开(公告)日：2018-01-18
申请号：PCT/US2017/040117
申请日：2017-06-29
Applicant: CYMER, LLC
Inventor： BIBBY, JR, Thomas Frederick Allen , ZURITA, Omar , SUBRAMANIAN, Abhishek , DUFFEY, Thomas Patrick , TAHBOUB, Khalid Khulusi , ROKITSKI, Rostislav , HARAN, Donald James , THORNES, Joshua Jon
IPC: G03B27/02 , G03B7/20 , H01L21/027
Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
Abstract translation: 用于处理由光学系统产生的光束的图像以提取指示光学系统中的光学元件的损坏程度的信息的方法和设备。 还公开了能够在多个位置中的任何一个处获取光束的图像的光束图像和分析工具。
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