公开(公告)号：WO2018132198A1

公开(公告)日：2018-07-19

申请号：PCT/US2017/064556

申请日：2017-12-04

Applicant: CYMER, LLC ,  ASML NETHERLANDS B.V.

Inventor： DUFFEY, Thomas Patrick ,  EVERTS, Frank ,  KING, Brian Edward ,  THORNES, Joshua Jon ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria ,  GODFRIED, Herman, Philip

IPC: G03F7/20

Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep -ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light, beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate with in a lithography exposure apparatus.

公开(公告)号：WO2015169581A1

公开(公告)日：2015-11-12

申请号：PCT/EP2015/058564

申请日：2015-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip

IPC: G01J1/42 ,  G01J1/58 ,  G03F7/20

CPC classification number: G01J1/58 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70558 ,  G03F7/70616 ,  G03F7/7085

Abstract: Disclosed is a lithographic apparatus comprising a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus comprises a first sensor apparatus comprising a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.

Abstract translation: 公开了一种包括监视装置和相关监视装置的光刻设备。 监视装置被配置用于监视第一波长的第一辐射。 监测装置包括第一传感器装置，其包括被配置为吸收第一辐射并且发射表示第一辐射的第二辐射的金刚石荧光材料，第二辐射是第二波长; 以及被配置为感测第二辐射的第二传感器装置。

公开(公告)号：WO2020173635A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/051861

申请日：2020-01-27

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria

IPC: G03F7/20

Abstract: A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.

公开(公告)号：WO2019174885A1

公开(公告)日：2019-09-19

申请号：PCT/EP2019/054340

申请日：2019-02-21

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip ,  EVERTS, Frank ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria

IPC: H01S3/13 ,  H01S3/134 ,  G03F7/20 ,  H01S3/097 ,  H01S3/104

Abstract: A control system for controlling a laser, comprising a sensor for sensing a physical value indicative of a characteristic of a laser beam emitted by the laser, a switch, a first controller and a second controller. Each controller is configured, to receive a further sensor value from the sensor, adjust a received setpoint value based on the received further sensor value to give an output value and cause the laser to operate in accordance with the output value. The switch is configured to switch between the controllers such that output values are provided from each controller in a cyclic fashion.

公开(公告)号：WO2022207245A1

公开(公告)日：2022-10-06

申请号：PCT/EP2022/055762

申请日：2022-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip

IPC: G03B27/54 ,  G03F7/20 ,  G02B13/14 ,  G02B19/00 ,  G02B27/00 ,  G02B27/48

Abstract: A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.

公开(公告)号：WO2016041733A1

公开(公告)日：2016-03-24

申请号：PCT/EP2015/069209

申请日：2015-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica ,  RIJKE, Arij, Jonathan ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/20 ,  G03F7/70008 ,  G03F7/70058 ,  G03F7/70358 ,  G03F7/709

Abstract: A lithographic apparatus comprises: a radiation system (SO, IL, BD); a frame (BF, MF); a substrate table (WT) for holding a substrate (W); a scanning mechanism (PW). The radiation system is operable to produce a radiation beam (PB). The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism (AC) is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.

Abstract translation: 光刻设备包括：辐射系统（SO，IL，BD）; 一个框架（BF，MF）; 用于保持衬底（W）的衬底台（WT）; 扫描机构（PW）。 辐射系统可操作以产生辐射束（PB）。 衬底台可移动地安装到框架并且布置成使得衬底的目标部分被布置成接收辐射束。 扫描机构可操作以相对于框架移动衬底台，使得衬底的不同部分可以接收辐射束。 机构（AC）可操作以确定指示辐射系统相对于帧的速度的量。 调节机构可操作以控制辐射束的功率或辐照度，以便由于辐射系统和框架的相对运动而减少由衬底接收的辐射剂量的变化。

公开(公告)号：WO2019166173A1

公开(公告)日：2019-09-06

申请号：PCT/EP2019/052267

申请日：2019-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： EVERTS, Frank ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria ,  GODFRIED, Herman, Philip

IPC: G03F7/20 ,  G05B13/02

Abstract: A radiation source (33) configured to provide a radiation beam, the radiation source being controlled by a controller (32), the controller comprising a first feedback algorithm configured to process a signal (41) indicative of the radiation beam and control the radiation source in dependence on the received signal, wherein the controller is in communication with a processor (39), the processor being configured to receive an operating parameter (40a - 40e) of the radiation source, generate a second feedback algorithm based on the received operating parameter, and cause the controller to operate in accordance with the second feedback algorithm.

公开(公告)号：WO2017050506A1

公开(公告)日：2017-03-30

申请号：PCT/EP2016/069879

申请日：2016-08-23

Applicant: ASML NETHERLANDS B.V. ,  CYMER INC.

Inventor： EVERTS, Frank ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria ,  GODFRIED, Herman, Philip ,  THORNES, Joshua, Jon ,  O'BRIEN, Kevin, Michael ,  SAANEN, Leon, Pieter, Paul ,  AGGARWAL, Tanuj

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70066 ,  G03F7/70525

Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.

Abstract translation: 一种控制辐射源输出的方法，所述方法包括：周期性地监测辐射源的输出能量; 确定参考能量信号和所监视的输出能量之间的差异; 确定反馈值; 在随后的时间段内确定辐射源的期望输出能量; 以及根据所确定的期望的输出能量在随后的时间段期间控制辐射源的输入参数。 如果所监测的辐射源的输出能量与参考能量信号之间所确定的差值的大小超过阈值：所确定的差值对反馈值无贡献; 并且根据参考能量信号调整曲线将确定的差分扩展到随后的时间段，并且将参考能量信号调整曲线添加到随后时间段的参考能量信号。

公开(公告)号：WO2017008951A1

公开(公告)日：2017-01-19

申请号：PCT/EP2016/062615

申请日：2016-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： OP'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria ,  GODFRIED, Herman, Philip ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica ,  RIJKE, Arij, Jonathan ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VERHEES, Mathijs, Leonardus, Johan

IPC: G03F7/20

CPC classification number: G03F7/70041 ,  G03F7/70133 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/709

Abstract: Projecting a pulsed radiation beam (PB) using an illumination system (IL) onto a region of a plane in a reference frame; using a scanning mechanism (PW) to move a calibration sensor (CS) relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.

Abstract translation: 使用照明系统（IL）将脉冲辐射束（PB）投影到参考系中的平面区域上; 使用扫描机构（PW）相对于参考框架移动校准传感器（CS），使得校准传感器沿着扫描轨迹移动穿过该平面中的辐射束; 确定指示所述照明系统相对于所述参考系的速度的量; 以及根据以下步骤确定与所述平面中的所述辐射束的空间强度分布有关的信息：（a）所述校准传感器的输出; （b）校准传感器的扫描轨迹; 和（c）指示照明系统相对于参考系的速度的量。

公开(公告)号：WO2016045897A1

公开(公告)日：2016-03-31

申请号：PCT/EP2015/069508

申请日：2015-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： GODFRIED, Herman, Philip ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica ,  OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria

IPC: G03F7/20

CPC classification number: G03F7/70116 ,  G02F1/133526 ,  G03F7/70133 ,  G03F7/7085

Abstract: An illumination system (IL) for a lithographic apparatus comprises an array of lenses (2a-h) configured to receive a beam of radiation (B) and focus the beam of radiation into a plurality of sub-beams (4a-h), an array of reflective elements (6a-h) configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam (8), a beam splitting device (10) configured to split the illumination beam into a first portion (12) and a second portion (14) wherein the first portion is directed to be incident on a lithographic patterning device (MA), a focusing unit (22) configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements (24) configured to measure the intensity of radiation which is incident on the detection plane.

Abstract translation: 用于光刻设备的照明系统（IL）包括被配置为接收辐射束（B）并且将辐射束聚焦成多个子光束（4a-h）的透镜阵列（2a-h）， 被配置为接收子光束并反射子光束以形成照明光束（8）的反射元件阵列（6a-h）;分束装置（10），被配置为将照明光束分成第一部分 （12）和第二部分（14），其中第一部分指向入射到光刻图案形成装置（MA）上，聚焦单元（22）被配置为将照明光束的第二部分聚焦到检测平面上，使得 在检测平面处形成图像，其中图像是子光束彼此不重叠的子光束的图像，以及被配置为测量辐射强度的检测器元件（24）的阵列， 事件在检测平面上。