公开(公告)号：WO2004044025A8

公开(公告)日：2004-10-07

申请号：PCT/US0336354

申请日：2003-11-12

Applicant: HONEYWELL INT INC ,  BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  SUEDEMEYER ARLENE ,  HEBERT MELLO ,  LI BO

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  SUEDEMEYER ARLENE ,  HEBERT MELLO ,  LI BO

IPC: C08G20060101 ,  C08G77/02 ,  C08G77/14 ,  C08G77/18 ,  C08G77/22 ,  C08L83/06 ,  C09D183/06 ,  C09D183/08 ,  G03F7/075 ,  G03F7/09

CPC classification number: C08G77/14 ,  C08G77/22 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0757 ,  G03F7/091

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

Abstract translation: 用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密剂，至少一种封端剂， 至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。 合适的吸收化合物是吸收可用于光刻的波长（例如365nm，248nm，193nm和157nm）附近的吸收化合物。

公开(公告)号：WO2004044025A3

公开(公告)日：2004-07-15

申请号：PCT/US0336354

申请日：2003-11-12

Applicant: HONEYWELL INT INC ,  BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  SUEDEMEYER ARLENE ,  HEBERT MELLO ,  LI BO

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  SUEDEMEYER ARLENE ,  HEBERT MELLO ,  LI BO

IPC: C08G20060101 ,  C08G77/02 ,  C08G77/14 ,  C08G77/18 ,  C08G77/22 ,  C08L83/06 ,  C09D183/06 ,  C09D183/08 ,  G03F7/075 ,  G03F7/09

CPC classification number: C08G77/14 ,  C08G77/22 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0757 ,  G03F7/091

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

Abstract translation: 用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密化剂，至少一种封端剂， 至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂，和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。 合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。

公开(公告)号：WO2005041255A3

公开(公告)日：2009-04-02

申请号：PCT/US2004025231

申请日：2004-08-04

Applicant: HONEYWELL INT INC ,  KENNEDY JOSEPH ,  STUCK JASON

Inventor： KENNEDY JOSEPH ,  STUCK JASON

IPC: C04B41/50 ,  H01L20060101

CPC classification number: H01L21/3122 ,  C09D183/04 ,  C09D183/16 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3124 ,  H01L21/31695 ,  H01L21/76808

Abstract: A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.

Abstract translation: 牺牲涂层材料包括：至少一种无机化合物和至少一种材料改性剂，其中牺牲涂层材料可溶于碱性化学或氟基化学。 制造牺牲涂料的方法包括：提供至少一种无机化合物，提供至少一种材料改性剂，将至少一种无机化合物与至少一种材料改性剂组合以形成牺牲涂料，其中牺牲 涂料可溶于碱性化学物质或氟基化学物质，但不溶于有机BARC材料中通常使用的有机浇铸溶剂。

公开(公告)号：WO03044078A9

公开(公告)日：2004-01-08

申请号：PCT/US0236327

申请日：2002-11-12

Applicant: HONEYWELL INT INC ,  BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  HEBERT MELLO ,  SUEDMEYER ARLENE

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  HEBERT MELLO ,  SUEDMEYER ARLENE

IPC: C08G77/04 ,  C09D183/04 ,  G03F7/09 ,  C08G77/08 ,  C08G77/18

CPC classification number: C08G77/04 ,  C09D183/04 ,  G03F7/091

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

Abstract translation: 用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种封端剂，至少一种流平剂， 至少一种催化剂，至少一种替代溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。 合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。