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    METHOD OF REMOVING WATER FROM HYDROFLUOROCARBON MANUFACTURING PROCESSES
    3.
    发明申请
    METHOD OF REMOVING WATER FROM HYDROFLUOROCARBON MANUFACTURING PROCESSES 审中-公开
    从氢氟碳化物制造工艺中去除水的方法

    公开(公告)号：WO2005058781A1

    公开(公告)日：2005-06-30

    申请号：PCT/US2004/041403

    申请日：2004-12-10

    Applicant: HONEYWELL INTERNATIONAL INC. ,  TUNG, Hsueh, Sung ,  STUCK, Jason, T.

    Inventor： TUNG, Hsueh, Sung ,  STUCK, Jason, T.

    IPC: C07C17/395

    CPC classification number: C07B39/00 ,  C07C17/38 ,  Y02P20/582

    Abstract: Disclosed are improved fluorination processes and fluorine-containing compositions which involve introducing to one or more fluorination process compositions a water reactive agent in an amount and under conditions effective to decrease the amount of water in that composition. The water reactive agent is preferably introduced to the fluorination process at a location downstream of the fluorination reaction, in amounts and under conditions effective to produce a relatively lower concentration of water in the composition, and preferably throughout the fluorination process.

    Abstract translation: 公开了改进的氟化方法和含氟组合物，其涉及在有效降低该组合物中的水量的量和条件下向一种或多种氟化方法组合物引入水反应剂。 水反应剂优选在氟化反应的下游位置以有效地在组合物中产生相对较低浓度的水，并且优选在整个氟化过程中的量和条件下引入氟化过程。

    COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF
    8.
    发明申请
    COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
    涂料组合物通过薄膜和光刻胶应用的优化及其制备方法

    公开(公告)号：WO2005041255A3

    公开(公告)日：2009-04-02

    申请号：PCT/US2004025231

    申请日：2004-08-04

    Applicant: HONEYWELL INT INC ,  KENNEDY JOSEPH ,  STUCK JASON

    Inventor： KENNEDY JOSEPH ,  STUCK JASON

    IPC: C04B41/50 ,  H01L20060101

    CPC classification number: H01L21/3122 ,  C09D183/04 ,  C09D183/16 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3124 ,  H01L21/31695 ,  H01L21/76808

    Abstract: A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.

    Abstract translation: 牺牲涂层材料包括：至少一种无机化合物和至少一种材料改性剂，其中牺牲涂层材料可溶于碱性化学或氟基化学。 制造牺牲涂料的方法包括：提供至少一种无机化合物，提供至少一种材料改性剂，将至少一种无机化合物与至少一种材料改性剂组合以形成牺牲涂料，其中牺牲 涂料可溶于碱性化学物质或氟基化学物质，但不溶于有机BARC材料中通常使用的有机浇铸溶剂。

    COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF
    9.
    发明申请
    COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
    涂料组合物通过薄膜和光刻胶应用的优化及其制备方法

    公开(公告)号：WO2005041255A2

    公开(公告)日：2005-05-06

    申请号：PCT/US2004/025231

    申请日：2004-08-04

    Applicant: HONEYWELL INTERNATIONAL, INC. ,  KENNEDY, Joseph ,  STUCK, Jason

    Inventor： KENNEDY, Joseph ,  STUCK, Jason

    IPC: H01L

    CPC classification number: H01L21/3122 ,  C09D183/04 ,  C09D183/16 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3124 ,  H01L21/31695 ,  H01L21/76808

    Abstract: A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.

    Abstract translation: 牺牲涂层材料包括：至少一种无机化合物和至少一种材料改性剂，其中牺牲涂层材料可溶于碱性化学或氟基化学。 制造牺牲涂料的方法包括：提供至少一种无机化合物，提供至少一种材料改性剂，将至少一种无机化合物与至少一种材料改性剂组合以形成牺牲涂料，其中牺牲 涂料可溶于碱性化学物质或氟基化学物质，但不溶于有机BARC材料中通常使用的有机浇铸溶剂。

    COATINGS AND HARD MASK COMPOSITIONS FOR INTEGRATED CIRCUIT APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF
    10.
    发明申请
    COATINGS AND HARD MASK COMPOSITIONS FOR INTEGRATED CIRCUIT APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
    用于集成电路应用的涂层和硬掩模组合物，其生产方法及其用途

    公开(公告)号：WO2005037907A1

    公开(公告)日：2005-04-28

    申请号：PCT/US2004/032789

    申请日：2004-10-05

    Applicant: HONEYWELL INTERNATIONAL INC. ,  KENNEDY, Joseph ,  HUANG, Wei, T. ,  DO, Kim, N. ,  STUCK, Jason

    Inventor： KENNEDY, Joseph ,  HUANG, Wei, T. ,  DO, Kim, N. ,  STUCK, Jason

    IPC: C08K3/22

    CPC classification number: C09D183/04

    Abstract: A coating material is described herein that includes at least one inorganic compound, and at least one densifying agent, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound. A method of producing a coating material is described herein that includes: providing at least one inorganic compound, providing at least one densifying agent, combining the at least one inorganic compound with the at least one densifying agent to form the coating material, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound.

    Abstract translation: 本文描述了包括至少一种无机化合物和至少一种致密化剂的涂层材料，其中与至少一种无机化合物的密度相比，致密化剂增加了涂层材料的密度。 本文描述了制备涂料的方法，其包括：提供至少一种无机化合物，提供至少一种致密化剂，将至少一种无机化合物与至少一种致密化剂结合以形成涂层材料，其中致密化 与至少一种无机化合物的密度相比，增加了涂层材料的密度。

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