公开(公告)号：WO2019135819A1

公开(公告)日：2019-07-11

申请号：PCT/US2018/057896

申请日：2018-10-29

Applicant: KLA-TENCOR CORPORATION

Inventor： LUBASHEVSKY, Yuval ,  PASKOVER, Yuri ,  LEVINSKI, Vladimir ,  MANASSEN, Amnon

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01N21/4788 ,  G01N21/9501 ,  G02B27/4255 ,  G03F7/70625

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and - first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and - diffraction patterns. The + and - diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：WO2018063471A3

公开(公告)日：2018-04-05

申请号：PCT/US2017/041404

申请日：2017-07-10

Applicant: KLA-TENCOR CORPORATION

Inventor： PASKOVER, Yuri ,  MANASSEN, Amnon ,  LEVINSKI, Vladimir

IPC: G01B11/02 ,  G01B9/02

Abstract: Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.

公开(公告)号：WO2015080858A1

公开(公告)日：2015-06-04

申请号：PCT/US2014/064851

申请日：2014-11-10

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir ,  YOEL, Feler ,  KANDEL, Daniel

IPC: H01L21/66 ,  G03F1/38 ,  G03F7/20 ,  G01B11/00 ,  G01B11/14

CPC classification number: G03F1/42 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683 ,  G06F17/5072 ,  H01L22/30

Abstract: Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.

Abstract translation: 提供了计量目标，目标设计方法和计量方法。 计量目标包括属于两个或更多目标元素类型的目标元素。 每个目标元素类型包括将指定的生产参数偏移到指定范围的未解决的特征，从而为诸如焦点和剂量的过程参数提供灵敏度监控和优化工具。

公开(公告)号：WO2014074868A1

公开(公告)日：2014-05-15

申请号：PCT/US2013/069224

申请日：2013-11-08

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir ,  FELER, Yoel ,  KANDEL, Daniel

IPC: H01L21/027

CPC classification number: G03F1/38 ,  G01B11/14 ,  G03F1/70 ,  G03F7/70641 ,  G03F7/70683

Abstract: A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.

Abstract translation: 分割的掩模包括一组单元结构，其中每个单元结构包括沿着第一方向具有不可解析的分割间距的一组特征，其中沿着第一方向的不可解析的分割间距小于光刻印刷工具的照明，其中 所述多个单元结构具有沿着垂直于所述第一方向的第二方向的间距，其中所述不可分辨的分割间距适于产生用于将所述光刻工具的最佳聚焦位置移动所选量的印刷图案，以实现所选择的等级 聚焦灵敏度。

公开(公告)号：WO2014004555A1

公开(公告)日：2014-01-03

申请号：PCT/US2013/047682

申请日：2013-06-25

Applicant: KLA-TENCOR CORPORATION

Inventor： SAPIENS, Noam ,  SELIGSON, Joel ,  LEVINSKI, Vladimir ,  KANDEL, Daniel ,  FELER, Yoel ,  BRINGOLTZ, Barak ,  MANASSEN, Amnon ,  BENISTY, Eliav

IPC: H01L21/66

CPC classification number: G01N21/4788 ,  G01N2201/06113 ,  G02B27/56 ,  G02B27/58

Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed, the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.

Abstract translation: 本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。 光学元件布置成增强目标反射的辐射消散模式。 公开了各种配置，光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质堆叠以及用于放大照明辐射的渐逝模式的谐振元件。 计量系统和方法可配置为各种计量类型，包括成像和散射方法。

公开(公告)号：WO2020091733A1

公开(公告)日：2020-05-07

申请号：PCT/US2018/058068

申请日：2018-10-30

Applicant: KLA-TENCOR CORPORATION

Inventor： FELER, Yoel ,  LEVINSKI, Vladimir

IPC: G03F7/20 ,  H01L21/66

Abstract: Metrology targets, target design methods and metrology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations. Targets comprise one or more pairs of segmented periodic structures having a same coarse pitch, a same 1:1 line to space ratio and segmented into fine elements at a same fine pitch, wherein the segmented periodic structures differ from each other in that one thereof lacks at least one of its corresponding fine elements and/or in that one thereof comprises two groups of the fine elements which are separated from each other by a multiple of the fine pitch. The missing element(s) and/or central gap enable deriving the estimation of aberration effects from measurements of the corresponding segmented periodic structures. The fine pitches may be selected to correspond to the device fine pitches in the corresponding layer.

公开(公告)号：WO2018187108A1

公开(公告)日：2018-10-11

申请号：PCT/US2018/024702

申请日：2018-03-28

Applicant: KLA-TENCOR CORPORATION

Inventor： MANASSEN, Amnon ,  NEGRI, Daria ,  HILL, Andrew V. ,  BACHAR, Ohad ,  LEVINSKI, Vladimir ,  PASKOVER, Yuri

IPC: H01L21/66

Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

公开(公告)号：WO2018147938A1

公开(公告)日：2018-08-16

申请号：PCT/US2017/066853

申请日：2017-12-15

Applicant: KLA-TENCOR CORPORATION

Inventor： ADAM, Ido ,  LEVINSKI, Vladimir ,  MANASSEN, Amnon ,  LUBASHEVSKY, Yuval

IPC: G03F7/20 ,  H01L21/66

Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity - to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.

公开(公告)号：WO2018128984A1

公开(公告)日：2018-07-12

申请号：PCT/US2018/012070

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： LUBASHEVSKY, Yuval ,  PASKOVER, Yuri ,  LEVINSKI, Vladimir ,  MANASSEN, Amnon

IPC: G01N21/47 ,  G01N21/88

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and - first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and - diffraction patterns. The + and - diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：WO2017176314A1

公开(公告)日：2017-10-12

申请号：PCT/US2016/060626

申请日：2016-11-04

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir ,  HAJAJ, Eitan ,  ITZKOVICH, Tal ,  AHARON, Sharon ,  ADEL, Michael E.

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/027 ,  H01L21/66

Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.

Abstract translation: 提供度量目标和目标设计方法，其中目标元素通过用具有间距p的周期性图案替换具有与被替换元素至少一个几何差异的辅助元素到 形成将间距p保持为单个间距的复合周期性结构。 在与先进的多重图案化技术的兼容性范围内构建目标可提高目标的保真度，并且填充因子调制能够调整目标以产生足够的计量灵敏度以提取覆盖图，同时实现目标的过程兼容性。