公开(公告)号：WO2019099379A1

公开(公告)日：2019-05-23

申请号：PCT/US2018/060754

申请日：2018-11-13

Applicant: LAM RESEARCH CORPORATION

Inventor： WU, Ying ,  PATERSON, Alex ,  DREWERY, John ,  SATO, Arthur

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/32963 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/68757 ,  H03H11/28

Abstract: Systems and methods for applying frequency and match tuning in a non-overlapping manner are described. For example, a radio frequency (RF) generator is tuned for a time interval and an impedance match is not tuned for the time interval. The impedance match is tuned before or after the RF generator is tuned. Such a non-overlap in the tuning of the RF generator and the impedance match facilitates a reduction in reflected power during a pulse without the tuning of the RF generator interfering with the tuning of the impedance match.

公开(公告)号：WO2011049994A3

公开(公告)日：2011-04-28

申请号：PCT/US2010/053264

申请日：2010-10-19

Applicant: LAM RESEARCH CORPORATION ,  LONG, Maolin ,  JAFARIAN-TEHRANI, Seyed Jafar ,  SATO, Arthur ,  BENJAMIN, Neil Martin Paul ,  WILLIAMS, Norman

Inventor： LONG, Maolin ,  JAFARIAN-TEHRANI, Seyed Jafar ,  SATO, Arthur ,  BENJAMIN, Neil Martin Paul ,  WILLIAMS, Norman

IPC: H05H1/46 ,  H01L21/3065 ,  H03H7/40

Abstract: A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

公开(公告)号：WO2013078465A1

公开(公告)日：2013-05-30

申请号：PCT/US2012/066467

申请日：2012-11-23

Applicant: LAM RESEARCH CORPORATION ,  SATO, Arthur

Inventor： SATO, Arthur

IPC: H01L21/683

CPC classification number: H02H3/46 ,  H01J37/32174 ,  H01J37/32944 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/68742 ,  H05F3/00

Abstract: A system for decoupling arcing RF signals in a plasma chamber including a top electrode, an electrostatic chuck for supporting a semiconductor wafer, and a capacitor coupled between the at least one of a plurality of clamping electrodes in the surface of the electrostatic chuck and a baseplate of the electrostatic chuck, the capacitor having a capacitance of greater than about 19 nanofarads, the capacitor disposed within an interior volume of the electrostatic chuck. A method of decoupling arcing RF signals in a plasma chamber is also disclosed.

Abstract translation: 一种用于在包括顶部电极，用于支撑半导体晶片的静电卡盘和耦合在静电卡盘的表面中的多个夹紧电极中的至少一个夹持电极之间的电容器的等离子体室中去耦电弧RF信号的系统和基板 的电容器具有大于约19纳法的电容，电容器设置在静电卡盘的内部容积内。 还公开了一种在等离子体室中去耦电弧RF信号的方法。