公开(公告)号：WO2014085252A1

公开(公告)日：2014-06-05

申请号：PCT/US2013/071484

申请日：2013-11-22

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： DAUGHENBAUGH, Randy, E. ,  HELLRING, Stuart, D. ,  PEFFER, Robin, M.

IPC: C25D15/00 ,  C25D15/02 ,  C09D5/44 ,  C09D7/12 ,  H01M4/04 ,  H01M4/139 ,  C08K3/22 ,  C08K3/04 ,  H01M4/1397 ,  H01M4/58

CPC classification number: H01M4/0452 ,  C08K3/04 ,  C08K3/22 ,  C09D5/448 ,  C09D7/61 ,  C25D13/16 ,  C25D15/02 ,  H01M4/0457 ,  H01M4/136 ,  H01M4/139 ,  H01M4/1397 ,  H01M4/505 ,  H01M4/525 ,  H01M4/5825 ,  H01M4/622 ,  H01M4/625 ,  H01M4/661 ,  H01M10/0525 ,  Y02E60/122

Abstract: Methods are disclosed in which an electrically conductive substrate is immersed into an electrodepositable composition, the substrate serving as an electrode in an electrical circuit comprising the electrode and a counter-electrode immersed in the composition, a coating being applied onto or over at least a portion of the substrate as electric current is passed between the electrodes. The electrodepositable composition comprises: (a) an aqueous medium; (b) an ionic resin; and (c) solid particles.

Abstract translation: 公开了一种方法，其中将导电衬底浸入可电沉积组合物中，该衬底用作电路中包含电极的电极和浸在该组合物中的对电极，将涂层施加到至少一部分上或之上 的电流在电极之间通过。 电沉积组合物包括：（a）水性介质; （b）离子树脂; 和（c）固体颗粒。

公开(公告)号：WO2010027545A8

公开(公告)日：2010-03-11

申请号：PCT/US2009/048402

申请日：2009-06-24

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： VANIER, Noel, R. ,  HELLRING, Stuart, D. ,  CHENG-HUNG, Hung

IPC: C01B31/30 ,  C01B31/34 ,  C01B31/36 ,  C01B3/34

Abstract: A method for producing ultrafine metal carbide particles and hydrogen is disclosed. The method includes introducing a metal-containing precursor and a carbon-containing precursor into a thermal reaction chamber, heating the precursors in the thermal reaction chamber to form the ultrafine metal carbide particles from the precursors and to form carbon monoxide and hydrogen, collecting the ultrafine doped metal carbide particles, converting at least a portion of the carbon monoxide to carbon dioxide and generating additional hydrogen, and recovering at least a portion of the hydrogen.

公开(公告)号：WO2002102920A1

公开(公告)日：2002-12-27

申请号：PCT/US2002/018575

申请日：2002-06-13

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： HELLRING, Stuart, D. ,  MC CANN, Colin, P. ,  BABU, Suryadevara, V. ,  LI, Yuzhuo ,  SATISH, Narayanan

IPC: C09K3/14

CPC classification number: B82Y30/00 ,  C01B33/18 ,  C01B33/193 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/19 ,  C01P2006/90 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  C23F3/00 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/3212

Abstract: This invention relates to a silica, a slurry composition, and a method of their preparation. In particular, the silica of the present invention includes aggregated primary particles. The slurry composition which incorporates the silica, is suitable for polishing articles and especially useful for chemical-mechanical planarization of semiconductor substrates and other microelectronic substrates.

Abstract translation: 本发明涉及二氧化硅，浆料组合物及其制备方法。 特别地，本发明的二氧化硅包括聚集的一次粒子。 掺入二氧化硅的浆料组合物适用于抛光制品，特别适用于半导体衬底和其他微电子衬底的化学机械平面化。

公开(公告)号：WO2020205038A1

公开(公告)日：2020-10-08

申请号：PCT/US2020/015302

申请日：2020-01-28

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： WALTERS, David, N. ,  REINHARDT, Emily, S. ,  KUTCHKO, Cynthia ,  HELLRING, Stuart, D.

IPC: C09D183/08

Abstract: A coating composition includes a polymer prepared from a mixture of reactants including (a) a fluorinated polysiloxane and (b) an alkoxy silane functional resin. The alkoxy silane functional resin includes a polyurethane resin or an acrylic resin. A substrate at least partially coated with the coating composition is also disclosed. A method of condensing a polar fluid by contacting a substrate at least partially coated with the coating composition with a polar fluid, such that the polar fluid condenses on at least a portion of the coated substrate is also disclosed.

公开(公告)号：WO2002102910A1

公开(公告)日：2002-12-27

申请号：PCT/US2002/018574

申请日：2002-06-13

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： HELLRING, Stuart, D. ,  MC CANN, Colin, P. ,  KAHLE, Charles, F. ,  LI, Yuzhuo ,  KELEHER, Jason

IPC: C09G1/02

CPC classification number: C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/3212

Abstract: This invention relates to a slurry composition and a method of its preparation. In particular, the slurry composition of the present invention includes a silica wherein the silica comprises a surface modification. The silica-based slurry of the present invention is suitable for polishing articles and especially useful for chemical-mechanical planarization ("CMP") of semiconductor and other microelectronic substrates.

Abstract translation: 本发明涉及一种浆料组合物及其制备方法。 特别地，本发明的浆料组合物包括二氧化硅，其中二氧化硅包括表面改性。 本发明的二氧化硅基浆料适用于抛光制品，特别适用于半导体和其他微电子基板的化学机械平面化（“CMP”）。