IMAGING DEVICE WITH IMAGE DISPERSING TO CREATE A SPATIALLY CODED IMAGE
    3.
    发明申请
    IMAGING DEVICE WITH IMAGE DISPERSING TO CREATE A SPATIALLY CODED IMAGE 审中-公开
    具有图像分解以创建空间编码图像的成像装置

    公开(公告)号:WO2016154445A1

    公开(公告)日:2016-09-29

    申请号:PCT/US2016/024029

    申请日:2016-03-24

    摘要: An image capturing device (202) can include a sensor array (210), a lens (230) positioned at a first distance from an intermediate image (235), and apolychromat (220) positioned at a second distance from the lens (230). The poly chro mat (220) can diffract the intermediate image (235) according to a transform function (207) to produce a dispersed sensor image (215) onto the sensor array (210). The dispersed sensor image (215) can represent a spatial code of the intermediate image (235).

    摘要翻译: 图像捕获装置(202)可以包括传感器阵列(210),与中间图像(235)定位在第一距离处的透镜(230)和位于距离透镜(230)的第二距离处的聚烯烃(220) 。 多色板(220)可以根据变换函数(207)衍射中间图像(235),以在传感器阵列(210)上产生分散的传感器图像(215)。 分散的传感器图像(215)可以表示中间图像(235)的空间代码。

    DIFFRACTIVIE OPTIC
    4.
    发明申请
    DIFFRACTIVIE OPTIC 审中-公开

    公开(公告)号:WO2012051613A3

    公开(公告)日:2012-04-19

    申请号:PCT/US2011/056540

    申请日:2011-10-17

    IPC分类号: G06K9/46 G06K7/10 G06K9/18

    摘要: A method for designing a diffractive optic includes identifying an initial performance metric for the diffractive optic (110), the diffractive optic including a substrate. A test cell is selected from an array of cells on the substrate (120). A height of the test cell is changed by a predetermined height unit (130). Images are computed at a plurality of discrete wavelengths (140) or using a continuous spectrum using diffraction-based propagation through at least a portion of the array of cells. A wavelength metric is determined for each of the images (150). The wavelength metrics for each of the images is consolidated into a perturbed performance metric (160). The perturbed performance metric is compared to the initial performance metric (170) and the method identifies (180) whether the perturbed performance metric is an improvement over the initial performance metric.

    TRANSLUCENT IMAGING SYSTEM AND RELATED METHODS

    公开(公告)号:WO2019071155A1

    公开(公告)日:2019-04-11

    申请号:PCT/US2018/054650

    申请日:2018-10-05

    IPC分类号: G01N21/01

    摘要: An imaging system that is translucent can be achieved by placing an image sensor (204) at one of more edges or periphery of a translucent window (202). A small fraction of light from the outside scene scatters off imperfections (218) in the translucent window (202) and reach the peripheral image sensor (204). Based on appropriate calibration of the response of point sources (206) from the outside scene, the full scene can be reconstructed computationally from the peripherally scattered light (210, 212). The technique can be extended to color, multi-spectral, light-field, 3D, and polarization selective imaging. Applications can include surveillance, imaging for autonomous agents, microscopy, etc.

    LENSLESS IMAGING DEVICE
    6.
    发明申请
    LENSLESS IMAGING DEVICE 审中-公开
    无透镜成像装置

    公开(公告)号:WO2018064660A1

    公开(公告)日:2018-04-05

    申请号:PCT/US2017/054728

    申请日:2017-10-02

    摘要: Technology is described for methods and systems for imaging an object (110). The method can include an image sensor (116) exposed to light (114) from an object (110) without passing the light through an image modification element. Light intensity of the light (114) can be stored as data in a medium. The image data can be analyzed at a processor (902) as a reconstructed image of the object (110).

    摘要翻译: 描述了用于对对象成像的方法和系统的技术(110)。 该方法可以包括从物体(110)暴露于光(114)而不使光通过图像修改元件的图像传感器(116)。 光(114)的光强度可以作为数据存储在介质中。 图像数据可以在处理器(902)处被分析为对象(110)的重建图像。

    PROGRAMMABLE PHOTOLITHOGRAPHY
    7.
    发明申请
    PROGRAMMABLE PHOTOLITHOGRAPHY 审中-公开
    可编程光刻

    公开(公告)号:WO2013056238A2

    公开(公告)日:2013-04-18

    申请号:PCT/US2012/060270

    申请日:2012-10-15

    发明人: MENON, Rajesh

    IPC分类号: G03F7/26 G03F7/20 H01L21/027

    摘要: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.

    摘要翻译: 可编程光刻的方法包括将可编程光掩模定位(910)在样本上的光致抗蚀剂层附近。 用多个不同波长的光同时照射(920)可编程光掩模,以预定图案曝光光致抗蚀剂层。 可编程光掩模与光致抗蚀剂层分离(930)并且光致抗蚀剂层被显影(940)以在光致抗蚀剂层中产生预定图案。