PENETRATABLE RETINAL SHIPS FOR TREATING IMPAIRED VISION
    1.
    发明申请
    PENETRATABLE RETINAL SHIPS FOR TREATING IMPAIRED VISION 审中-公开
    用于治疗视力受损的可穿透视网膜

    公开(公告)号:WO2017117217A1

    公开(公告)日:2017-07-06

    申请号:PCT/US2016/068870

    申请日:2016-12-28

    Abstract: Embodiments of the present disclosure pertain to methods of treating retinal impairment in a subject by implanting a retinal chip into the subject's retina. The retinal chip includes a photosensitive component with at least a portion associated with a membrane of the retina, and a transmitting component with at least a portion that penetrates through one or more cellular layers of the retina. The photosensitive component is capable of generating electric current upon exposure to light and transmitting the electric current to the transmitting component. The transmitting component is capable of transmitting electric current to at least one or more cellular layers of the retina and providing electrical stimulation to individual cells in the cellular layers. The retinal impairment to be treated may be associated with an eye disease, such as age-related macular degeneration. Additional embodiments of the present disclosure pertain to the aforementioned retinal chips.

    Abstract translation: 本公开的实施例涉及通过将视网膜芯片植入受试者的视网膜中来治疗受试者中的视网膜损伤的方法。 视网膜芯片包括具有与视网膜的膜相关联的至少一部分的光敏部件和具有穿透视网膜的一个或多个细胞层的至少一部分的透射部件。 感光组件在曝光时能够产生电流并将电流传输至传输组件。 发射部件能够将电流传输至视网膜的至少一个或多个细胞层并且向细胞层中的各个细胞提供电刺激。 要治疗的视网膜损伤可能与眼部疾病有关,例如年龄相关性黄斑变性。 本公开的另外的实施方式涉及前述的视网膜芯片。

    DIRECT FORMATION POROUS MATERIALS FOR ELECTRONIC DEVICES
    2.
    发明申请
    DIRECT FORMATION POROUS MATERIALS FOR ELECTRONIC DEVICES 审中-公开
    直接形成电子设备的多孔材料

    公开(公告)号:WO2017062786A1

    公开(公告)日:2017-04-13

    申请号:PCT/US2016/056020

    申请日:2016-10-07

    Abstract: A method for forming an electronic device may comprising the steps of selecting a substrate for an electronic device, and depositing a porous film utilizing physical vapor deposition, dry deposition, evaporative deposition, e-beam evaporation, plasma enhanced chemical vapor deposition, or atomic layer deposition. In some embodiments, a deposition rate, temperature, pressure, or combination thereof may be carefully controlled during deposition to generate the porous film. Further, the depositing of the porous film occurs without the need for further processing. Additional steps may also include depositing an additional layer for the electronic device. In some case, the method may also include depositing and/or patterning a secondary electronic device on top or below the first electronic device.

    Abstract translation: 一种形成电子器件的方法可以包括以下步骤:选择用于电子器件的衬底,以及利用物理气相沉积,干法沉积,蒸发沉积,电子束蒸发,等离子体增强化学气相沉积或原子层沉积多孔膜 沉积。 在一些实施例中,沉积速率,温度,压力或其组合可以在沉积期间小心地控制以产生多孔膜。 此外,多孔膜的沉积发生,而不需要进一步加工。 附加步骤还可以包括为电子设备沉积附加层。 在一些情况下,该方法还可以包括在第一电子设备的顶部或下方沉积和/或图案化次级电子设备。

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