Abstract:
A photocurable resin composition comprising: (a) a modified resin prepared by the reaction of either a conjugate diene polymer having a number-average molecular weight of 500 to 5,000 and a vinyl content of at least 50 mole % or an adduct prepared from the diene polymer and an α,β-unsaturated dicarboxylic acid anhydride and having a softening of 70 to 200 °C as measured by the ring and ball softening point method of JIS K 2531-60 with an α,β-unsaturated monocarboxylic ester having an alcoholic hydroxyl group represented by general formula (I) to thereby effect the ring opening of at least 10 mole % of the acid anhydride groups of the adduct, wherein R1 and R2 each represents a hydrogen atom or a methyl group and R3 represents a residue of a C2 or higher hydrocarbon which may contain a heteroatom, (b) an inorganic or organic powder having a mean particle diameter of 5 νm or less, or a grafted inorganic powder prepared by grafting an (un)saturated and (un)substituted hydrocarbon residue onto an inorganic powder having a particle size of 0.1 νm or less, wherein the total number of carbon atoms of the hydrocarbon residues grafted onto one inorganic atom is 4 or above, and (c) a photopolymerization initiator.
Abstract:
The present invention is directed to rubber modified polymers which contains a functionalized (that is, highly grafted) rubber having a degree of grafting of at least 30 percent at the point of phase inversion and a specified amount of grafted vinyl aromatic polymer.
Abstract:
A photocurable resin composition comprising: (a) a modified resin prepared by the reaction of either a conjugate diene polymer having a number-average molecular weight of 500 to 5,000 and a vinyl content of at least 50 mole % or an adduct prepared from the diene polymer and an α,β-unsaturated dicarboxylic acid anhydride and having a softening of 70 to 200 °C as measured by the ring and ball softening point method of JIS K 2531-60 with an α,β-unsaturated monocarboxylic ester having an alcoholic hydroxyl group represented by general formula (I) to thereby effect the ring opening of at least 10 mole % of the acid anhydride groups of the adduct, wherein R1 and R2 each represents a hydrogen atom or a methyl group and R3 represents a residue of a C2 or higher hydrocarbon which may contain a heteroatom, (b) a wax having a melting point of 100 °C or below as determined by the dropping method of ASTM D 127, and (c) a photopolymerization initiator.
Abstract:
A block copolymer having (meth)acryloyl groups in the side chains, which is obtained from a block copolymer having a skeleton comprising at least one polymer block derived from an aromatic vinyl compound and at least one polymer block derived from a conjugated diene compound by epoxidizing the double bonds derived from the conjugated diene compound and reacting a carboxylic acid having a (meth)acryloyl group with the epoxy groups by ring-opening addition; and an adhesive, sealant, coating, or sizing composition containing the same.
Abstract:
A method of fabricating polymeric matrices suitable for use in non-aqueous electrochemical cells is provided. The method includes forming an organic emulsion comprising an organic solvent and having a polar phase comprising polar polymer precursors and a non-polar phase comprising non-polar polymer precursors wherein the polar phase is substantially immiscible in the non-polar phase, said emulsion further including an effective amount of surfactant to maintain said emulsion; and initiating polymerization of said polar polymer precursors to form first polymers and of said non-polar polymer precursors to form second polymers wherein said first polymers are cross-linked by said second polymers to form a polymeric matrix. The polymeric matrix will have superior physical strenght and puncture resistance.
Abstract:
A photocurable resin composition comprising: (a) a conjugated diene polymer or copolymer containing functional groups (I) and (II) and having a number-average molecular weight of 500 to 5,000 and a vinyl content of at least 50 mole %, wherein R1 represents a C1 to C20 hydrocarbon residue which may contain a heteroatom, R2 and R3 each represents a hydrogen atom or a methyl group, and R4 represents a C2 to C20 hydrocarbon residue which may contain a heteroatom, and (b) a photopolymerization initiator.