Abstract:
Polyparaxylylene (PPX) polymer films that can be expanded into porous articles that have a node and fibril microstructure are provided. The fibrils contain PPX polymer chains oriented with the fibril axis. The PPX polymer may contain one or more comonomer. PPX polymer articles may be formed by applying PPX to one or both sides of a substrate, such as by vapor deposition. The nominal thickness of the PPX polymer film(s) is less than about 50 microns. The PPX polymer film(s) may be removed from the substrate to form a free-standing PPX polymer film(s), which may then be stretched into a porous article.
Abstract:
This invention relates to compositions and methods for improving the impact properties of polymer-matrix composites and to improving the adhesion of resin compositions to substrate materials. More particularly, the invention relates to compositions and methods for improving the impact properties of ring opening metathesis polymerization (ROMP) polymer-matrix composites and to improving the adhesion of ROMP compositions to substrate materials using adhesion promoters containing at least two isocyanate groups and functional elastomers comprising a maleic anhydride grafted styrene-ethylene/butylene-styrene hydrogenated copolymer in a resin composition. The polymer products produced via ROMP reactions of the invention may be utilized for a wide range of materials and composite applications. The invention has utility in the fields of polymer and materials chemistry and manufacture.
Abstract:
It discloses a composition for adhering one or more polymers to a substrate. The composition comprises at least one first compound adapted to be coated on a surface of the substrate. The first compound comprises one or more first units each having at least one functional group adapted to chemically react with at least one monomer to form the one or more polymers. Said composition also comprises at least one second compound adapted to be coated on the surface of the substrate. The second compound comprising one or more second units interspersed among the one or more first units of the first compound. Each of the one or more second units is not chemically reactive to the at least one monomer. It also discloses a method of preparing a polymer coated surface on a substrate using the composition described.
Abstract:
Polyparaxylyiene (PPX) polymers that can be expanded into porous articles that have a node and fibril microstructure are provided. The fibrils contain PPX polymer chains oriented with the fibril axis. The PPX polymer may contain one or more comonomer. PPX polymer articles may be formed by applying PPX to a substrate by vapor deposition. The nominal thickness of the PPX polymer film is less than about 50 microns. The PPX polymer film may be removed from the substrate to form a free-standing PPX polymer film, which may then be stretched into a porous article. Alternatively, a PPX polymer article can be formed by lubricating PPX polymer powder, heating the lubricated powder, and calendering or ram extruding to produce a preform that can subsequently be stretched into a porous article. The heating and expansion temperatures are from about 80°C to about 220°C or from about 220°C to about 290°C or from about 290°C to about 450°C.
Abstract:
New precursors and processes to generate fluorinated poly(para-xylylenes) ("PPX") and their chemically modified films suitable for fabrications of integrated circuit ("Ics") of
Abstract:
A low−permittivity and high−heat−resistance organic polymer film applicable to the insulation layer of a semiconductor device, a production method therefor, and a semiconductor device using it. A polyparaxylylene film including a porous structure, obtained by the step of sublimating the cyclic dimer of paraxylylene or its derivative, the step of pyrolyzing the obtained sublimate at 800−950°C, and the step of polymerizing the obtained pyrolysate; a production method therefor; and a semiconductor device.
Abstract:
An organic polymer film which can be produced by a method comprising sublimating a cyclophane compound containing fluorine at 30 to 70˚C, thermally decomposing the sublimated product at 680 to 770˚C into a para−xylylene monomer, polymerizing the para−xylylene monomer on a base plate at −40 to 20˚C to thereby provide a fluorinated poly(para−xylylene), and then subjecting the fluorinated poly(para−xylylene) to specific gradual heating steps of programmed (temperature rising) heating and constant temperature heating; a method for producing the polymer film and a semiconductor device using the polymer film. The organic polymer film exhibits a low dielectric constant and also high heat resistance, and thus can be suitably applied to an insulating layer for use in a semiconductor device.
Abstract:
New precursors and processes to generate fluorinated poly(para-xylylenes) ("PPX") and their chemically modified films suitable for fabrications of integrated circuit ("Ics") of