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    WASTE GAS ABATEMENT TECHNOLOGY FOR SEMICONDUCTOR PROCESSING
    1.
    发明申请
    WASTE GAS ABATEMENT TECHNOLOGY FOR SEMICONDUCTOR PROCESSING 审中-公开

    公开(公告)号：WO2022066511A1

    公开(公告)日：2022-03-31

    申请号：PCT/US2021/050775

    申请日：2021-09-17

    申请人： QOLIBRI, INC.

    发明人： MAHAWILI, Imad

    IPC分类号： B01D46/00 ,  B01D53/70

    摘要： A semiconductor waste abatement system for a semiconductor processing system includes a vacuum pump, an abatement apparatus having an abatement chamber in fluid communication with a source of semiconductor waste gas from the semiconductor processing chamber, and with the abatement chamber configured to ionize the waste gas and to exhaust ionized gas. The abatement system further includes a filter apparatus with a filter chamber, which forms a liquid reservoir. The inlet of the filter apparatus is in fluid communication with the outlet of the abatement chamber and the liquid reservoir, and the outlet of the filter apparatus is in communication with the inlet of the vacuum pump, wherein the filter chamber is under a vacuum, and wherein semiconductor waste gas is ionized in the abatement chamber and then filtered by the filter apparatus prior to input to the vacuum pump.

    用于联合脱除废弃物气化气中二噁英与粉尘的装置与工艺
    2.
    发明申请
    用于联合脱除废弃物气化气中二噁英与粉尘的装置与工艺 审中-公开

    公开(公告)号：WO2021168760A1

    公开(公告)日：2021-09-02

    申请号：PCT/CN2020/077058

    申请日：2020-02-28

    申请人： 青岛理工大学

    发明人： 张华伟 ,  张鼎元 ,  梁鹏 ,  田原宇 ,  张亚青 ,  焦甜甜

    IPC分类号： B01D45/12 ,  B01D53/86 ,  B01D53/70 ,  B01J23/80

    摘要： 一种用于联合脱除废弃物气化气中二噁英与粉尘的装置与工艺，将径向床从内到外依次分为内通道(5)、填料区(3)及外通道(4)，并且在内通道(5)内设置旋风除尘器(6)，高温废弃物气化气从位于旋风除尘器(6)侧面的进料口(1)进入，在旋风除尘器(6)内经过除尘后，气相从旋风除尘器(6)的顶部排出，固相从旋风除尘器(6)的底部排出；排出的气相不需降温直接进入填料区(3)内进行催化和二次除尘，在催化剂的作用下，降解二噁英及有机氯。装置结构简单，集成设计后节约占地面积，工艺不产生二次污染，易于推广使用。

    排ガスのプラズマ除害方法とその装置
    4.
    发明申请
    排ガスのプラズマ除害方法とその装置 审中-公开

    公开(公告)号：WO2020121587A1

    公开(公告)日：2020-06-18

    申请号：PCT/JP2019/029445

    申请日：2019-07-26

    申请人： カンケンテクノ株式会社 ,  北京康肯▲環▼保▲設▼▲備▼有限公司

    发明人： 池奥　哲也

    IPC分类号： B01D53/74 ,  B01D53/70 ,  B01J19/08 ,  H01L21/205 ,  H05H1/26

    摘要： 熱分解塔に投入された排ガスの全量が必ずプラズマジェットによって形成された高温領域を通過し、確実に分解されるプラズマ除害方法を提供する。 複数のプラズマジェット（Ｐ）を点（Ｑ）に向けて集中させる方法で、排ガス（Ｈ）の反応空間（Ｄ）に向けて設置された複数のプラズマジェットトーチ（２ａ、２ｂ、（２ｃ））から前記反応空間（Ｄ）内の或る点（Ｑ）に向けてそれぞれのプラズマジェット（Ｐ）を発生させ、前記複数のプラズマジェットトーチ（２ａ、２ｂ、（２ｃ））の間から前記点（Ｑ）に向けて排ガス（Ｈ）を供給する。

    PROCESS FOR PREPARING ETHYLENE CARBONATE AND ETHYLENE GLYCOL USING AN ALKYL IODIDE GUARD BED SYSTEM
    8.
    发明申请
    PROCESS FOR PREPARING ETHYLENE CARBONATE AND ETHYLENE GLYCOL USING AN ALKYL IODIDE GUARD BED SYSTEM 审中-公开

    公开(公告)号：WO2019110716A1

    公开(公告)日：2019-06-13

    申请号：PCT/EP2018/083755

    申请日：2018-12-06

    申请人： SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. ,  SHELL OIL COMPANY

    发明人： BASTINGS, Roel, Guillaume, Hubertus, Leonardus ,  BLACK, Jesse, Raymond ,  BOJOVIC, Vesna ,  EVANS, Wayne, Errol

    IPC分类号： C07D317/38 ,  B01D53/02 ,  B01D53/70 ,  C07C31/20 ,  C07C29/10

    摘要： The invention relates to a process for producing ethylene glycol and/or ethylene carbonate, said process comprising contacting at least a portion of a recycle gas stream comprising an alkyl iodide impurity with a guard bed system positioned upstream of an ethylene oxide reactor to produce a treated recycle gas stream, wherein said guard bed system comprises a guard bed material comprising silver on alumina; contacting a feed gas stream comprising ethylene, oxygen and at least a portion of the treated recycle gas stream with an epoxidation catalyst in the ethylene oxide reactor to produce an epoxidation reaction product comprising ethylene oxide; and contacting at least a portion of the epoxidation reaction product comprising ethylene oxide with an aqueous absorbent in the presence of an iodide-containing catalyst in an absorber to produce an aqueous product stream comprising ethylene carbonate and/or ethylene glycol and the recycle gas stream comprising the alkyl iodide impurity, wherein the recycle gas stream supplied to the guard bed system comprises (a) no more than 0.6 mol% of water; and/or (b) no more than 90 ppmv of ethylene oxide, based on total recycle gas stream supplied to the guard bed system.