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公开(公告)号：WO2013176378A1
公开(公告)日：2013-11-28
申请号：PCT/KR2013/001085
申请日：2013-02-12
申请人： 케이피엑스케미칼주식회사 , 삼성전자주식회사
CPC分类号： B24B37/24 , B24B37/26 , B24D11/001 , B24D11/003 , B24D18/00
摘要： 본 발명에 따른 연마층 형성 물질을 혼합시키고 화학적 반응에 의해 고상화시켜 연마 패드를 제조하는 방법은, 유기물을 물리적 방법으로 분쇄하여 미세 유기 입자로 형성시키는 단계와; 상기 단계에서 형성된 미세 유기 입자를 상기 연마층 형성 물질에 혼합시키는 단계와; 상기 단계의 혼합물에 포어 사이즈 컨트롤이 가능한 불활성 기체, 캡슐형 발포제, 화학적 발포제 중 적어도 어느 하나를 혼합하여, 기상 포어를 형성하는 단계와; 상기 단계를 통해 생성된 혼합물을 겔화 및 경화시켜 연마층을 제조하는 단계와; 상기 연마층을 가공하여 표면에 기상 포어의 개방에 의한 기공들을 분포시키는 단계를 포함하는 것을 특징으로 한다.
摘要翻译： 根据本发明，通过混合抛光层形成材料并通过化学反应固化材料来制造抛光垫的方法包括：通过使用物理方法粉碎有机材料来形成微有机颗粒的步骤; 将上述步骤中形成的微有机颗粒与抛光层形成材料混合的步骤; 通过将上述步骤获得的混合物与孔径可控惰性气体，胶囊型发泡剂或化学发泡剂混合形成气孔的步骤; 通过凝胶化和固化在上述步骤中获得的混合物来生产抛光层的步骤; 以及通过加工抛光层将孔分布在表面上的气孔的开口的步骤。
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公开(公告)号：WO2009152278A2
公开(公告)日：2009-12-17
申请号：PCT/US2009/046960
申请日：2009-06-10
发明人： MOLDOVAN, Nicolaie , CARLISLE, John
CPC分类号： B24D18/00 , B24D3/06 , Y10T428/24612
摘要： The present invention describes a microfabricated or nanofabricated structured diamond abrasive with a high surface density array of geometrical protrusions of pyramidal, truncated pyramidal or other shape, of designed shapes, sizes and placements, which provides for improved conditioning of CMP polishing pads, or other abrasive roles. Three methods of fabricating the structured diamond abrasive are described: molding of diamond into an array of grooves of various shapes and sizes etched into Si or another substrate material, with subsequent transferal onto another substrate and removal of the Si; etching of an array of geometrical protrusions into a thick diamond layer, and depositing a thick diamond layer over a substrate pre-patterned (or pre-structured) with an array of geometrical protrusions of designed sizes, shapes and placements on the surface.
摘要翻译： 本发明描述了具有设计形状，尺寸和布置的锥形，截头锥体或其它形状的几何突起的高表面密度阵列的微加工或纳米结构的金刚石磨料，其提供了CMP抛光垫或其它研磨剂 角色。 描述了制造结构金刚石研磨剂的三种方法：将金刚石模制成蚀刻到Si或另一种基底材料中的各种形状和尺寸的凹槽的阵列，随后转移到另一基底上并除去Si; 将几何突起的阵列蚀刻成厚的金刚石层，以及在预先图案化（或预先构造的）衬底上沉积厚金刚石层，其具有在表面上设计尺寸，形状和布置的几何突起阵列。
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公开(公告)号：WO2022236348A1
公开(公告)日：2022-11-17
申请号：PCT/AT2022/060128
申请日：2022-04-25
IPC分类号： B24D5/02 , B24D18/00 , B24D3/16 , B24B33/082 , B24D18/0009 , B24D3/04 , B24D3/28 , B30B11/04 , B30B9/28
摘要： Verfahren zur Herstellung eines keramisch gebundenen Schleifwerkzeugs (1), insbesondere Honrings, wobei die folgenden Verfahrensschritte in chronologischer Reihenfolge durch zu führ en sind : in einem ersten Verfahrensschritt werden zumindest ein Schleifmittel (2), insbesondere Korund, SiC, Aluminiumoxid und/ oder Superschleifmittel, zumindest ein anorganisches Bindemittel (3), insbesondere als Niederbrandbindung ausgebildet, und zumindest ein organisches Bindemittel (4), insbesondere in Form von Epoxidharz, bereit gestellt und vermischt, das zumindest eine Schleifmittel (2), das zumindest eine anorganische Bindemittel (3) und das zumindest eine organische Bindemittel (4) werden in einem Kaltpressverfahrensschritt (5) zu einem kaltgepressten Grünling (6) vorgepresst, der kaltgepresste Grünling (6) wird in einem Heißpressverfahrensschritt (7) zu einem heißgepressten Grünling (8) verpresst, der heißgepresste Grünling (8) wird in einem Brennver fahrensschritt (9) zu einem Schleifwerkzeugrohling (10), insbesondere Honringrohling, gebrannt, wobei während dem Brennver fahrensschritt (9) das zumindest eine organische Bindemittel (4) zumindest teilweise ausgebrannt wird, und - der Schleifwerkzeugrohling (10) wird in einem nachgelagerten Verfahrensschritt (11) zu dem Schleifwerkzeug (1), in welchem Schleifmittel (2) eingebettet ist, nachbearbeitet.
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公开(公告)号：WO2021257136A1
公开(公告)日：2021-12-23
申请号：PCT/US2021/021370
申请日：2021-03-08
发明人： JAWALI, Puneet Narendra , BARADANAHALLI KENCHAPPA, Nandan , FUNG, Jason G. , WEWALA GONNAGAHADENIYAGE, Shiyan Akalanka Jayanath , BAJAJ, Rajeev , MANZONIE, Adam Wade , LAWING, Andrew Scott
摘要： Embodiments herein generally relate to polishing pads and method of forming polishing pads. In one embodiment, a polishing pad having a polishing surface that is configured to polish a surface of a substrate is provided. The polishing pad includes a polishing layer. At least a portion of the polishing layer comprises a continuous phase of polishing material featuring a plurality of first regions having a first pore-feature density and a plurality of second regions having a second pore-feature density that is different from the first pore-feature density. The plurality of first regions are distributed in a pattern in an X-Y plane of the polishing pad in a side-by-side arrangement with the plurality of second regions and individual portions or ones of the plurality of first regions are interposed between individual portions or ones of the plurality of second regions.
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公开(公告)号：WO2021097313A1
公开(公告)日：2021-05-20
申请号：PCT/US2020/060545
申请日：2020-11-13
发明人： ZHANG, Daming , SARANGI, Nilanjan , ZHANG, Zhongya , LU, Lu
摘要： An abrasive article can include a body including abrasive particles contained in the body and ceramic particles contained within a bond material. The ceramic particles can have an average particle size D50c of at least 2 microns and at most 75 microns. The abrasive particles can include an average particle size D50a greater than the average particle size D50c.
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6.发明申请SHAPED ABRASIVE PARTICLES, METHODS OF MAKING, AND ABRASIVE ARTICLES INCLUDING THE SAME 审中-公开形状磨料颗粒，制造方法和包括其的磨料制品
公开(公告)号：WO2014070468A1
公开(公告)日：2014-05-08
申请号：PCT/US2013/065421
申请日：2013-10-17
CPC分类号： C09K3/1409 , B24D3/08 , B24D3/16 , B24D3/24 , B24D3/30 , B24D11/00 , C04B35/1115 , C04B35/6263 , C04B2235/3201 , C04B2235/3206 , C04B2235/3218 , C04B2235/3232 , C04B2235/3262 , C04B2235/3272 , C04B2235/3418 , C04B2235/349 , C04B2235/5436 , C04B2235/5445 , C04B2235/656 , C04B2235/72 , C04B2235/77 , C09K3/1436
摘要： A method of making abrasive particles includes: providing a slurry comprising non-colloidal solid particles and a liquid vehicle; forming at least a portion of the slurry into shaped bodies contacting a substrate; at least partially drying the shaped bodies to provide shaped abrasive precursor particles; separating at least a portion of the shaped abrasive precursor particles from the substrate; and converting at least a portion of the shaped abrasive precursor particles into shaped abrasive particles. The shaped abrasive particles comprise alpha alumina having an average crystal grain size of 0.8 to 8 microns and an apparent density that is at least 92 percent of the true density. Each shaped abrasive particle has a respective surface comprising a plurality of smooth sides that form at least four vertexes. Shaped abrasive particles, abrasive articles including them, and methods of using are also disclosed.
摘要翻译： 制造磨粒的方法包括：提供包含非胶体固体颗粒和液体载体的浆料; 将所述浆料的至少一部分形成为与基底接触的成形体; 至少部分地干燥成形体以提供成形磨料前体颗粒; 将所述成形研磨剂前体颗粒的至少一部分与所述基材分离; 并且将至少一部分成形的研磨剂前体颗粒转化成成型的磨料颗粒。 成形磨料颗粒包含平均晶粒尺寸为0.8至8微米并且表观密度为真实密度的至少92％的α氧化铝。 每个成形磨料颗粒具有包括形成至少四个顶点的多个平滑侧面的相应表面。 还公开了成形磨料颗粒，包括它们的磨料制品和使用方法。
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公开(公告)号：WO2009152278A3
公开(公告)日：2010-04-29
申请号：PCT/US2009046960
申请日：2009-06-10
发明人： MOLDOVAN NICOLAIE , CARLISLE JOHN
CPC分类号： B24D18/00 , B24D3/06 , Y10T428/24612
摘要： The present invention describes a microfabricated or nanofabricated structured diamond abrasive with a high surface density array of geometrical protrusions of pyramidal, truncated pyramidal or other shape, of designed shapes, sizes and placements, which provides for improved conditioning of CMP polishing pads, or other abrasive roles. Three methods of fabricating the structured diamond abrasive are described: molding of diamond into an array of grooves of various shapes and sizes etched into Si or another substrate material, with subsequent transferal onto another substrate and removal of the Si; etching of an array of geometrical protrusions into a thick diamond layer, and depositing a thick diamond layer over a substrate pre-patterned (or pre-structured) with an array of geometrical protrusions of designed sizes, shapes and placements on the surface.
摘要翻译： 本发明描述了具有设计形状，尺寸和布置的锥形，截头锥体或其它形状的几何突起的高表面密度阵列的微加工或纳米结构的金刚石磨料，其提供了CMP抛光垫或其它研磨剂 角色。 描述了制造结构金刚石研磨剂的三种方法：将金刚石模制成蚀刻到Si或另一种基底材料中的各种形状和尺寸的凹槽的阵列，随后转移到另一基底上并除去Si; 将几何突起的阵列蚀刻成厚的金刚石层，以及在预先图案化（或预先构造的）衬底上沉积厚金刚石层，其具有在表面上设计尺寸，形状和布置的几何突起阵列。
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8.发明申请
公开(公告)号：WO2008079680A1
公开(公告)日：2008-07-03
申请号：PCT/US2007/087155
申请日：2007-12-12
发明人： BAUER, Ralph , SKOWRON, Margaret L.
IPC分类号： B24D3/16 , B24D3/34 , B24D18/00 , C04B35/117 , C04B35/119 , C09K3/14
CPC分类号： B24D3/14 , B24D3/16 , B24D3/342 , B24D18/00 , C04B35/111 , C04B35/117 , C04B35/119 , C04B2235/3206 , C04B2235/3225 , C04B2235/3232 , C04B2235/3275 , C04B2235/3409 , C04B2235/3418 , C04B2235/36 , C04B2235/5409 , C04B2235/5445 , C04B2235/656 , C04B2235/77 , C04B2235/785 , C04B2235/96 , C04B2235/9661 , C09K3/1409
摘要： A high temperature bonded abrasive includes alumina abrasive grits, and a vitreous bond matrix in which the alumina abrasive grits are distributed, the vitreous bond matrix having a cure temperature not less than 1000°C. The alumina abrasive grits include polycrystalline alpha alumina having a fine crystalline microstructure characterized by an alpha alumina average domain size not greater than 500 nm, and the alumina abrasive grits further include a pinning agent that is a dispersed phase in the polycrystalline alpha alumina
摘要翻译： 高温粘结磨料包括氧化铝磨粒，以及其中分布有氧化铝磨粒的玻璃粘结基质，玻璃质基质的固化温度不低于1000℃。 氧化铝磨粒包括具有微结构微结构的多晶α氧化铝，其特征在于α氧化铝平均结构域尺寸不大于500nm，氧化铝磨粒还包括在多晶α氧化铝中分散相的钉扎剂
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公开(公告)号：WO2007148214A3
公开(公告)日：2008-05-22
申请号：PCT/IB2007001695
申请日：2007-06-22
申请人： ELEMENT SIX PRODUCTION PTY LTD , CAN ANTIONETTE , DAVIES GEOFFREY JOHN , MYBURGH JOHANNES LODEWIKUS
CPC分类号： B24D3/16 , B24D18/0054 , C09K3/1436
摘要： An ultrahard composite material comprises ultrahard particles dispersed in a phase transformable matrix material. The phase transformable matrix material is a single material including all possible crystallographic phases thereof, that comprises at least one component that is metastable at or near ambient temperature and the metastable component is capable of undergoing Martensitic phase transformation when the composite material is placed under stress, for example stress with a significant shear component. The stability of the matrix material at ambient temperature, and its ability to undergo phase transformation, is enhanced or optimised by ensuring that the matrix material comprises predominantly the crystallographic phase that is the metastable phase and/or by providing the matrix material in a nano grain size range that ensures it is metastable at or near ambient temperature. The metastable phase present will transform when stresses are applied during applications such as the machining of hard materials and the like.
摘要翻译： 超硬复合材料包含分散在相变基质材料中的超硬颗粒。 可相变基质材料是包括其所有可能的结晶相的单一材料，其包含至少一种在环境温度或接近环境温度下亚稳态的组分，并且当复合材料置于应力下时，亚稳组分能够经历马氏体相变， 例如具有显着剪切分量的应力。 通过确保基质材料主要包含作为亚稳相的结晶相和/或通过在纳米晶粒中提供基质材料来增强或优化基体材料在环境温度下的稳定性及其进行相变的能力 尺寸范围，确保在环境温度或接近环境温度时亚稳定。 当应用例如硬质材料等的加工时，施加应力时，存在的亚稳相将会变形。
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