摘要:
To provide a blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography, in which the need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc, is low, the TiO2-SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920°C and 970°C a dependence of its zero crossing temperature Tzc on the fictive temperature Tf which, expressed as the differential quotient dTzc/dTf, is less than 0.3.
摘要:
The present invention relates to a large format camera, which comprises a first camera (1) with a longitudinal centre axis (C), said first camera (1) comprising a first bellow (3), a first lens (5) having a shutter function and a film (7) for exposure, said first lens (5) being arranged at one end of the first camera (1) and the film (7) being arranged at the other end of the first camera (1). The invention also relates to a method for photographing in large format. Significant for the large format camera according to the present invention is that a second camera (1') is arranged with its longitudinal axis (C') perpendicular to the longitudinal axis (C) of the first camera (1), said second camera (1') comprising a second lens (5') and means (9') for sharpness information, that the second lens (5') is provided at one end of the second camera (1'), that the means (9') for sharpness information is provided at the other end of the second camera (1'), that the large format camera also comprises a mirror (10) that in active position is located in front of the lenses (5, 5'), that said mirror (10) in its active position is located in the intersectional point of the longitudinal centre axis (C) and (C') and lies on the bisector of the right angle between the longitudinal centre axes (C) and (C'), that the large format camera comprises means to transfer the mirror (10) from said active position to an inactive position beside the lenses (5, 5').