Invention Grant
- Patent Title: Solution treatment apparatus and solution treatment method
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Application No.: US15818855Application Date: 2017-11-21
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Publication No.: US10022652B2Publication Date: 2018-07-17
- Inventor: Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2012-039538 20120227; JP2012-288515 20121228
- Main IPC: B01D46/46
- IPC: B01D46/46 ; B01D53/30 ; B01D19/00 ; G03F7/30 ; H01L21/67 ; G03F7/16

Abstract:
A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
Public/Granted literature
- US20180093205A1 SOLUTION TREATMENT APPARATUS AND SOLUTION TREATMENT METHOD Public/Granted day:2018-04-05
Information query
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