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公开(公告)号：US09731226B2
公开(公告)日：2017-08-15
申请号：US14378337
申请日：2013-02-22
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
CPC classification number: B01D19/0063 , B01D19/0031 , B01D19/0068 , G03F7/16 , G03F7/30 , H01L21/6715
Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
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Patent Agency Ranking
公开(公告)号：US10022652B2
公开(公告)日：2018-07-17
申请号：US15818855
申请日：2017-11-21
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
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公开(公告)号：US20240219839A1
公开(公告)日：2024-07-04
申请号：US18557744
申请日：2022-03-31
Applicant: Tokyo Electron Limited , AICELLO CORPORATION
Inventor： Katsuhiro Tsuchiya , Takeshi Hirao , Hiroichi Inada , Yoshimichi Kutsuna , Takashi Yamamoto
Abstract: A technique capable of reducing, when processing a substrate by using a processing liquid, a burden in the processing and a burden in works involved in the processing is provided. A container includes a storage space forming unit 20 in which a storage space 59 storing therein a processing liquid configured to process a substrate is formed; a discharge port 25 of the processing liquid, provided in the storage space forming unit; and a fragile member 47 provided in the storage space forming unit and configured to be broken by being pressurized with a penetrating member in order to form an access path, the penetrating member being configured to pressurize the storage space such that the processing liquid is discharged from the discharge port, and the penetrating member being advanced into the storage space forming unit through the access path.
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公开(公告)号：US09878267B2
公开(公告)日：2018-01-30
申请号：US15639010
申请日：2017-06-30
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
CPC classification number: B01D19/0063 , B01D19/0031 , B01D19/0068 , G03F7/16 , G03F7/30 , H01L21/6715
Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
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公开(公告)号：US20180093205A1
公开(公告)日：2018-04-05
申请号：US15818855
申请日：2017-11-21
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
CPC classification number: B01D19/0063 , B01D19/0031 , B01D19/0068 , G03F7/16 , G03F7/30 , H01L21/6715
Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
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公开(公告)号：US20150000517A1
公开(公告)日：2015-01-01
申请号：US14378337
申请日：2013-02-22
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Katsunori Ichino , Toshinobu Furusho , Takashi Sasa , Katsuhiro Tsuchiya , Yuichi Terashita , Hirofumi Takeguchi
IPC: B01D19/00
CPC classification number: B01D19/0063 , B01D19/0031 , B01D19/0068 , G03F7/16 , G03F7/30 , H01L21/6715
Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.
Abstract translation: 一种与供给处理溶液供给到基板的供给喷嘴连接的固溶处理装置，具备：将处理液储存容器与供给喷嘴连接的供给管路; 设置在所述供给管道中的过滤装置; 过滤装置的二次侧的泵; 连接泵的排出侧和过滤装置的进气侧的循环管路; 供给控制阀，其设置在所述供给管路中的所述泵的次级侧; 设置在循环管道中的循环控制阀; 以及控制单元，其中，当通过关闭所述供给控制阀来停止从所述供给喷嘴向所述基板供给所述处理液时，所述控制单元打开所述循环控制阀并驱动所述泵，从而使所述处理液在所述供给管线 具有过滤装置和循环管道。
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