Invention Grant
- Patent Title: Formation of dielectric with smooth surface
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Application No.: US15065620Application Date: 2016-03-09
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Publication No.: US10070537B2Publication Date: 2018-09-04
- Inventor: Deepak Arora , Daniel N. Sobieski , Dilan Seneviratne , Ebrahim Andideh , James C. Meyer
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: B32B38/10
- IPC: B32B38/10 ; H05K3/46 ; C23C14/22 ; H05K3/42 ; H05K3/10 ; H01L21/48 ; B32B43/00 ; H01L21/44 ; H05K3/00 ; H05K3/28 ; H01L21/56

Abstract:
Embodiments of the present disclosure are directed towards techniques and configurations for formation of a dielectric with a smooth surface. In one embodiment, a method includes providing a dielectric with first and second surfaces, a conductive feature formed on the first surface, and a laminate applied to the second surface, curing the second surface while the laminate remains applied, and removing the laminate. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20160192508A1 FORMATION OF DIELECTRIC WITH SMOOTH SURFACE Public/Granted day:2016-06-30
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