公开(公告)号：US10090159B2

公开(公告)日：2018-10-02

申请号：US14768825

申请日：2014-05-05

Applicant: BASF SE

Inventor： Yongqing Lan ,  Peter Przybylski ,  Zhenyu Bao ,  Julian Proelss

IPC: C09K13/06 ,  H01L21/306 ,  C09G1/02 ,  C09K3/14 ,  H01L21/321

Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.

公开(公告)号：US09765239B2

公开(公告)日：2017-09-19

申请号：US14890754

申请日：2014-05-06

Applicant: BASF SE

Inventor： Yongqing Lan ,  Peter Przybylski ,  Zhenyu Bao ,  Julian Proelss

IPC: C09G1/02 ,  B24B37/04 ,  C09K3/14 ,  H01L21/306 ,  H01L21/02

CPC classification number: C09G1/02 ,  B24B37/044 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/02024 ,  H01L21/30625

Abstract: Described is a use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing one or more lll-V materials, wherein the chemical-mechanical polishing (CMP) composition comprises the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more constituents selected from the group consisting of (i) substituted and unsubstituted triazoles not having an aromatic ring annealed to the triazol ring, (ii) benzimidazole, (iii) chelating agents selected from the group consisting of amino acids with two or more carboxyl groups, aliphatic carboxylic acids, and the respective salts thereof, and (iv) homopolymers and copolymers of acrylic acid, and the respective salts thereof, (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.

公开(公告)号：US09862862B2

公开(公告)日：2018-01-09

申请号：US14891175

申请日：2014-05-05

Applicant: BASF SE

Inventor： Yongqing Lan ,  Peter Przybylski ,  Zhenyu Bao ,  Julian Proelss

IPC: C09G1/02 ,  H01L21/306 ,  C09K3/14 ,  H01L21/02

CPC classification number: C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/02024 ,  H01L21/30612 ,  H01L21/30625

Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polyethylene imines (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.

公开(公告)号：US09828527B2

公开(公告)日：2017-11-28

申请号：US15336245

申请日：2016-10-27

Applicant: BASF SE

Inventor： Yongqing Lan ,  Peter Przybylski ,  Zhenyu Bao ,  Julian Proelss

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/306

CPC classification number: C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/30625

Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.

公开(公告)号：US20170044402A1

公开(公告)日：2017-02-16

申请号：US15336245

申请日：2016-10-27

Applicant: BASF SE

Inventor： Yongqing Lan ,  Peter Przybylski ,  Zhenyu Bao ,  Julian Proelss

IPC: C09G1/02 ,  H01L21/306 ,  C09K3/14

CPC classification number: C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/30625

Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising the following components:(A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6(B) N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid(C) water(D) optionally one or more further constituents,wherein the pH of the composition is in the range of from 2 to 6.

Abstract translation: 其中所述组合物的pH在2至6的范围内。

公开(公告)号：US20140050992A1

公开(公告)日：2014-02-20

申请号：US13965509

申请日：2013-08-13

Applicant: BASF SE

Inventor： Alexander PANCHENKO ,  Evgueni Klimov ,  Oliver Gronwald ,  Klaus Leitner ,  Peter Przybylski

IPC: H01M4/133 ,  H01M4/36 ,  H01M4/1393 ,  H01M10/058 ,  H01M4/136 ,  H01M10/056

CPC classification number: H01M4/133 ,  H01M4/136 ,  H01M4/1393 ,  H01M4/364 ,  H01M10/052 ,  H01M10/056 ,  H01M10/0569 ,  H01M10/058 ,  Y10T29/49108

Abstract: The present invention relates to sulfur-carbon composite materials comprising(A) at least one carbon composite material comprising (a) a carbonization product of at least one carbonaceous starting material, incorporating (aa) particles of at least one electrically conductive additive, the particles having an aspect ratio of at least 10, and (B) elemental sulfur. In addition, the present invention also relates to a process for producing inventive sulfur-carbon composite materials, to cathode materials for electrochemical cells comprising inventive sulfur-carbon composite materials, to corresponding electrochemical cells and to the use of carbon composite materials for production of electrochemical cells.

Abstract translation: 本发明涉及硫 - 碳复合材料，其包含（A）至少一种碳复合材料，其包含（a）至少一种含碳原料的碳化产物，其包含（aa）至少一种导电添加剂的颗粒，所述颗粒 具有至少10的纵横比，和（B）元素硫。 此外，本发明还涉及本发明的硫 - 碳复合材料的制造方法，包括本发明的硫 - 碳复合材料的电化学电池的阴极材料，相应的电化学电池以及碳复合材料用于生产电化学 细胞。