- 专利标题: Storage element and memory
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申请号: US15667750申请日: 2017-08-03
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公开(公告)号: US10121963B2公开(公告)日: 2018-11-06
- 发明人: Yutaka Higo , Masanori Hosomi , Hiroyuki Ohmori , Tetsuya Yamamoto , Kazutaka Yamane , Yuki Oishi , Hiroshi Kano
- 申请人: Sony Corporation
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: K&L Gates LLP
- 优先权: JP2006-335016 20061212
- 主分类号: H01L43/10
- IPC分类号: H01L43/10 ; G11C11/16 ; H01F41/32 ; H01F10/32 ; B82Y25/00 ; H01L43/08 ; H01L43/02 ; H01L27/22
摘要:
A storage element includes a storage layer, a fixed magnetization layer, a spin barrier layer, and a spin absorption layer. The storage layer stores information based on a magnetization state of a magnetic material. The fixed magnetization layer is provided for the storage layer through a tunnel insulating layer. The spin barrier layer suppresses diffusion of spin-polarized electrons and is provided on the side of the storage layer opposite the fixed magnetization layer. The spin absorption layer is formed of a nonmagnetic metal layer causing spin pumping and provided on the side of the spin barrier layer opposite the storage layer. A direction of magnetization in the storage layer is changed by passing current in a layering direction to inject spin-polarized electrons so that information is recorded in the storage layer and the spin barrier layer includes at least a material selected from oxides, nitrides, and fluorides.
公开/授权文献
- US20170358738A1 STORAGE ELEMENT AND MEMORY 公开/授权日:2017-12-14
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