Invention Grant
- Patent Title: Electronic beam machining system
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Application No.: US15615324Application Date: 2017-06-06
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Publication No.: US10236157B2Publication Date: 2019-03-19
- Inventor: Peng Liu , Wei Zhao , Xiao-Yang Lin , Duan-Liang Zhou , Chun-Hai Zhang , Kai-Li Jiang , Shou-Shan Fan
- Applicant: Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: CN201610405200 20160608
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/30 ; C01B32/182 ; C01G39/06 ; H01J37/302 ; B82Y20/00 ; H01J37/305 ; H01J37/31 ; H01J37/315 ; H01J37/317 ; B82Y35/00

Abstract:
The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.
Public/Granted literature
- US20170358424A1 ELECTRONIC BEAM MACHINING SYSTEM Public/Granted day:2017-12-14
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