摘要:
A welding head for a welding apparatus, the head comprising an outer face attachable to a welding device such as an electron beam gun or laser, an inner face sealable to a workpiece, and an outer sealing ring and an inner sealing ring situated within the inner face and disposed on either side of an evacuatable region, wherein the inner face has a teardrop-shaped profile. Outer and inner sealing rings can be inflatable or formed from different materials, the outer sealing ring being formed from a material with a Shore hardness of between 50 to 70 and the inner sealing ring being formed from a material with a Shore hardness of 20 to 40. A bridging seal can extend from within the inner sealing ring to the outer sealing ring.
摘要:
The invention relates to a method of welding a vitreous biological sample at a temperature below the glass transition temperature of approximately −137° C. to a micromanipulator, also kept at a temperature below the glass transition temperature. Where prior art methods used IBID with, for example, propane, or a heated needle (heated resistively or by e/g/laser), the invention uses a vibrating needle to locally melt the sample. By stopping the vibration, the sample freezes to the micromanipulator. The heat capacity of the heated parts is small, and the amount of material that stays in a vitreous condition thus large.
摘要翻译:本发明涉及一种将玻璃态生物样品在低于大约-137℃的玻璃化转变温度的温度下焊接到也保持在低于玻璃化转变温度的温度下的显微操纵器的方法。 当现有技术方法使用IBID与例如丙烷或加热针(电阻加热或e / g /激光)时,本发明使用振动针来局部熔化样品。 通过停止振动,样品冻结到显微操纵器。 加热部件的热容量小,因此玻璃状态的材料的量变大。
摘要:
A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.
摘要:
An electron beam welding machine comprises an electron gun including a first beam adjusting means, a second beam adjusting means disposed spaced from the first beam adjusting means so as to be movable in the direction of an electron beam path, and position adjusting means for adjusting the position of the second beam adjusting means through rotary movement about an axis perpendicularly crossing the electron beam path and linear movements on a plane perpendicular to the electron beam path. The machine further includes a mirror and light source mounted on the electron gun to emit light on the electron beam path, and photodetectors mounted on the opposite sides of the second beam adjusting means so as to face the electron gun and a workpiece, whereby the correct position of the second beam adjusting means is detected.
摘要:
A beam generating tube in a welder has an anode connected to ground potential and a cathode-Wehnelt electrode circuit connected across a portion of a voltage divider which is connected to a high voltage source. The voltage drop across the portion of the voltage divider is varied by means of a control tube connected in parallel with that portion, the voltage at the control electrode of the control tube being varied as a function of the difference between the actual beam current and the desired beam current as set externally. A diode is connected from the cathode of the beam generating tube to the voltage divider tap so that the voltage drop across the control tube is limited when the welder is not in operation and no current flows from the voltage divider tap to the control tube when the welder is in operation. When the difference between the actual beam current and the desired beam current exceeds a predetermined difference, the energization of the beam generating tube is interrupted.
摘要:
A sealing device for sealing cylindrical objects passing through a wall of a vacuum chamber and which are to be rotated about their longitudinal axes comprising a two part annular resilient seal separable along a plane passing through a diameter of the seal. The parts are installed one on each section of a wall of the chamber which has been split into two parts which may be moved in relation to one another so that when the wall sections are separated the seal parts are separated and the inside of the vacuum chamber is accessible so that the cylindrical objects may be positioned part inside the chamber and the remainder extending outside the chamber. When the wall sections are brought to the closed position the seal parts meet along the plane and surround the cylinder so as to form an effective vacuum seal between wall and cylinder. Means are provided in the resilient seal for preventing leakage of air into the chamber along the interface between the two seal parts when the cylindrical objects are in rotation.
摘要:
A viewing system for monitoring the focus of a beam of charged particles at the impact spot in apparatus using such beam for the machining of a workpiece is described. The viewing system utilizes the charged-particle radiation moving reversely with respect to the beam from the impact spot and focuses this in an image plane. A fluorescent screen is provided in the image plane and behind the screen is a photoelectric detector having a photosensitive area smaller than the image of the particles on the screen whereby the intensity of the radiation incident upon the photoelectric device can be used an an indication of the focus of the beam on the impact spot. Various devices are illustrated and described.
摘要:
The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.
摘要:
The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.