Invention Grant
- Patent Title: Via and trench filling using injection molded soldering
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Application No.: US15610885Application Date: 2017-06-01
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Publication No.: US10383572B2Publication Date: 2019-08-20
- Inventor: John U. Knickerbocker , Shriya Kumar , Jae-Woong Nah
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent L. Jeffrey Kelly
- Main IPC: H05K3/40
- IPC: H05K3/40 ; A61B5/00 ; H01L21/768 ; H01L23/498 ; H01L23/532 ; H01L21/48 ; H05K1/03 ; H01L23/00 ; A61M5/00 ; B23K3/06 ; H01L23/66 ; H01L23/13 ; H01L23/15 ; B23K101/36 ; H01L23/538 ; H01L23/14

Abstract:
A method includes forming one or more vias in a substrate, forming a first photoresist layer on a top surface of the substrate and a second photoresist layer on a bottom surface of the substrate, patterning the first photoresist layer and the second photoresist layer to remove at least a first portion of the first photoresist layer and at least a second portion of the second photoresist layer, filling the one or more vias, the first portion and the second portion with solder material using injection molded soldering, and removing remaining portions of the first photoresist layer and the second photoresist layer.
Public/Granted literature
- US20180005932A1 VIA AND TRENCH FILLING USING INJECTION MOLDED SOLDERING Public/Granted day:2018-01-04
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