Invention Grant
- Patent Title: Pillar array structure with uniform and high aspect ratio nanometer gaps
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Application No.: US15474118Application Date: 2017-03-30
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Publication No.: US10393642B2Publication Date: 2019-08-27
- Inventor: Yann A. Astier , Robert L. Bruce , Joshua T. Smith , Chao Wang , Benjamin H. Wunsch
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: G01N15/00
- IPC: G01N15/00 ; G03F7/20 ; G01N15/10 ; B01L3/00 ; B03B5/48 ; B81B1/00 ; B81C1/00 ; B82B3/00 ; G03F7/00

Abstract:
A technique related to sorting entities is provided. An inlet is configured to receive a fluid, and an outlet is configured to exit the fluid. A nanopillar array, connected to the inlet and the outlet, is configured to allow the fluid to flow from the inlet to the outlet. The nanopillar array includes nanopillars arranged to separate entities by size. The nanopillars are arranged to have a gap separating one nanopillar from another nanopillar. The gap is constructed to be in a nanoscale range.
Public/Granted literature
- US20170205329A1 PILLAR ARRAY STRUCTURE WITH UNIFORM AND HIGH ASPECT RATIO NANOMETER GAPS Public/Granted day:2017-07-20
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