Biomarker detection using integrated purification-detection devices

    公开(公告)号:US11911762B2

    公开(公告)日:2024-02-27

    申请号:US17314496

    申请日:2021-05-07

    CPC classification number: B01L3/502753 G06T7/0012 B01L2300/0654

    Abstract: Techniques regarding integrated purification-detection devices for detecting one or more biomarkers are provided. For example, one or more embodiments described herein are directed to an apparatus, comprising a housing and a microfluidic chip contained within the housing. The microfluidic chip comprises a separation unit that separates, using one or more nano deterministic lateral displacement (nanoDLD) arrays, target biological entities having a defined size range from other biological entities included in a biological fluid sample. The microfluidic chip further comprises a detection unit that facilitates detecting presence of one or more biomarkers associated with the target biological entities using one or more detection molecules or macromolecules that chemically reacts with the one or more biomarkers.

    TAILORABLE ELECTRODE CAPPING FOR MICROFLUIDIC DEVICES

    公开(公告)号:US20220143605A1

    公开(公告)日:2022-05-12

    申请号:US17095538

    申请日:2020-11-11

    Abstract: A method of forming a microfluidic device is disclosed. The method includes forming a first dielectric layer on a substrate, forming electrodes partially into the first dielectric layer, and forming a second dielectric layer on the electrodes. The method includes filling, with a metal material, two wells formed in the second dielectric layer such that the metal material is in direct contact with the electrodes. The method includes forming a third dielectric layer on the metal material and second dielectric layer. The method includes filling, with a structural material, a channel formed between the wells such that the structural material does not directly contact the electrodes. The method includes forming a fourth dielectric layer on the third dielectric layer and the structural material, extracting the structural material through at least one vent hole in the fourth dielectric layer, and forming a fifth dielectric layer on the fourth dielectric layer.

    Precision fabrication of nanosieves

    公开(公告)号:US11186480B2

    公开(公告)日:2021-11-30

    申请号:US16276342

    申请日:2019-02-14

    Abstract: An exemplary method includes forming a sacrificial layer along sidewalls of an array of trenches that are indented into a substrate, depositing a fill layer over the sacrificial layer, and then creating an array of gaps between the fill layer and the substrate by removing the sacrificial layer along the sidewalls of the trenches, while maintaining a structural connection between the substrate and the fill layer at the floors of the trenches. The method further includes covering the substrate, the fill layer, and the gaps with a cap layer that seal fluid-tight against the substrate and the fill layer. The method further includes indenting a first reservoir and a second reservoir through the cap layer, and into the substrate and the fill layer, across the lengths of the array of gaps, so that the array of gaps connects the first reservoir in fluid communication with the second reservoir.

    MICROSCALE AND MESOSCALE CONDENSER DEVICES

    公开(公告)号:US20210231543A1

    公开(公告)日:2021-07-29

    申请号:US17227522

    申请日:2021-04-12

    Abstract: Microscale and/or mesoscale condenser arrays that can facilitate microfluidic separation and/or purification of mesoscale and/or nanoscale particles and methods of operation are described herein. An apparatus comprises a condenser array comprising pillars arranged in a plurality of columns, wherein a pillar gap greater than or equal to about 0.5 micrometers is located between a first pillar of the pillars in a first column of the columns and a second pillar of the plurality of pillars in the first column, and wherein the first pillar is adjacent to the second pillar. The first ratio can be characterized by Dx/Dy is less than or equal to a first defined value, wherein Dx represents a first distance across the lattice in a first direction, wherein Dy represents a second distance across the lattice in a second direction, and wherein the first direction is orthogonal to the second direction.

    STRUCTURE FACILITATING OPTICALLY CHECKING VIA FORMATION

    公开(公告)号:US20200166468A1

    公开(公告)日:2020-05-28

    申请号:US16203195

    申请日:2018-11-28

    Abstract: Techniques regarding one or more structures for checking the via formation are provided. For example, one or more embodiments described herein can comprise an apparatus, which can comprise a microfluidic channel positioned on a silicon substrate. The apparatus can also comprise a pattern of material comprised within the microfluidic channel and positioned on a surface of the silicon substrate. Further, the pattern of material can define a future location of a through-silicon via. An advantage of such an apparatus can be that the pattern of material can facilitate checking whether the through-silicon via is fully or partially formed.

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