- Patent Title: Non-contact electron beam probing techniques and related structures
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Application No.: US15918662Application Date: 2018-03-12
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Publication No.: US10403359B2Publication Date: 2019-09-03
- Inventor: Amitava Majumdar , Rajesh Kamana , Hongmei Wang , Shawn D. Lyonsmith , Ervin T. Hill , Zengtao T. Liu , Marlon W. Hug
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Holland & Hart LLP
- Main IPC: G11C13/04
- IPC: G11C13/04 ; G11C29/02 ; G11C13/00 ; G11C7/00 ; G11C29/50 ; G11C29/56

Abstract:
Methods, systems, and devices for non-contact electron beam probing techniques, including at one or more intermediate stages of fabrication, are described. One subset of first access lines may be grounded and coupled with one or more memory cells. A second subset of first access lines may be floating and coupled with one or more memory cells. A second access line may correspond to each first access line and may be configured to be coupled with the corresponding first access line, by way of one or more corresponding memory cells, when scanned with an electron beam. A leakage path may be determined by comparing an optical pattern generated in part by determining a brightness of each scanned access line and comparing the generated optical pattern with a second optical pattern.
Public/Granted literature
- US20190189209A1 NON-CONTACT ELECTRON BEAM PROBING TECHNIQUES AND RELATED STRUCTURES Public/Granted day:2019-06-20
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