- 专利标题: 2-transistor 2-magnetic tunnel junction (2T2MTJ) MRAM structure
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申请号: US16296225申请日: 2019-03-08
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公开(公告)号: US10651235B1公开(公告)日: 2020-05-12
- 发明人: Yi-Ting Wu , Jhen-Siang Wu , Po-Chun Yang , Yung-Ching Hsieh , Zong-Sheng Zheng , Jian-Jhong Chen , Jen-Yu Wang , Cheng-Tung Huang
- 申请人: UNITED MICROELECTRONICS CORP.
- 申请人地址: TW Hsin-Chu
- 专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人地址: TW Hsin-Chu
- 代理商 Winston Hsu
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@79b2389d
- 主分类号: H01L27/22
- IPC分类号: H01L27/22 ; G11C11/16 ; H01L43/08
摘要:
A first MRAM set includes a first transistor and a second transistor. The first transistor includes a first gate structure, a first source/drain doping region and a first common source/drain doping region. The second transistor includes a second gate structure, a second source/drain doping region and the first common source/drain doping region. A second MTJ is disposed on the second transistor. The first common source/drain doping region electrically connects to the second MTJ. A first MTJ is disposed on the first transistor. The sizes of the first MTJ and the second MTJ are different. The second MTJ connects to the first MTJ in series. A bit line electrically connects the first MTJ. A source line electrically connects to the first source/drain doping region and the second source/drain doping region.
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