Invention Grant
- Patent Title: Method and system for focus adjustment of a multi-beam scanning electron microscopy system
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Application No.: US16253106Application Date: 2019-01-21
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Publication No.: US10861671B2Publication Date: 2020-12-08
- Inventor: Doug K. Masnaghetti , Richard R. Simmons , Scott A. Young , Mark A. McCord , Rainer Knippelmeyer
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/21 ; H01J37/28 ; G02B21/20

Abstract:
A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
Public/Granted literature
- US20190172675A1 Method and System for Focus Adjustment of a Multi-Beam Scanning Electron Microscopy System Public/Granted day:2019-06-06
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