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1.发明授权公开(公告)号：US10861671B2
公开(公告)日：2020-12-08
申请号：US16253106
申请日：2019-01-21
发明人： Doug K. Masnaghetti , Richard R. Simmons , Scott A. Young , Mark A. McCord , Rainer Knippelmeyer
IPC分类号： H01J37/153 , H01J37/21 , H01J37/28 , G02B21/20
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
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公开(公告)号：US10192716B2
公开(公告)日：2019-01-29
申请号：US15245911
申请日：2016-08-24
IPC分类号： H01J37/244 , H01J37/28
摘要： Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.
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公开(公告)号：US20170084421A1
公开(公告)日：2017-03-23
申请号：US15245765
申请日：2016-08-24
IPC分类号： H01J37/04 , H01J37/244 , H01J37/09 , H01J37/22
CPC分类号： H01J37/244 , H01J37/045 , H01J37/28 , H01J37/3177 , H01J2237/0435 , H01J2237/057 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2448 , H01J2237/2805
摘要： Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.
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4.发明授权公开(公告)号：US10325753B2
公开(公告)日：2019-06-18
申请号：US15272194
申请日：2016-09-21
发明人： Doug K. Masnaghetti , Richard R. Simmons , Scott A. Young , Mark A. McCord , Rainer Knippelmeyer
IPC分类号： H01J37/153 , H01J37/21 , H01J37/28
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
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5.发明申请公开(公告)号：US20190172675A1
公开(公告)日：2019-06-06
申请号：US16253106
申请日：2019-01-21
发明人： Doug K. Masnaghetti , Richard R. Simmons , Scott A. Young , Mark A. McCord , Rainer Knippelmeyer
IPC分类号： H01J37/153 , H01J37/28 , H01J37/21
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
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6.发明申请公开(公告)号：US20170084423A1
公开(公告)日：2017-03-23
申请号：US15267223
申请日：2016-09-16
CPC分类号： H01J37/222 , H01J37/09 , H01J37/28 , H01J2237/0216 , H01J2237/2817
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.
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7.发明授权公开(公告)号：US10366862B2
公开(公告)日：2019-07-30
申请号：US15267223
申请日：2016-09-16
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.
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8.发明授权公开(公告)号：US10186396B2
公开(公告)日：2019-01-22
申请号：US15272194
申请日：2016-09-21
发明人： Doug K. Masnaghetti , Richard R. Simmons , Scott A. Young , Mark A. McCord , Rainer Knippelmeyer
IPC分类号： H01J37/153 , H01J37/28 , H01J37/21
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
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公开(公告)号：US20170084422A1
公开(公告)日：2017-03-23
申请号：US15245911
申请日：2016-08-24
IPC分类号： H01J37/22 , H01J37/244 , H01J37/06 , H01J37/29
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2804
摘要： Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.
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公开(公告)号：US10460905B2
公开(公告)日：2019-10-29
申请号：US15245765
申请日：2016-08-24
IPC分类号： H01J37/244 , H01J37/04 , H01J37/28 , H01J37/317
摘要： Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.
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