公开(公告)号：US10366862B2

公开(公告)日：2019-07-30

申请号：US15267223

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/09

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

公开(公告)号：US10186396B2

公开(公告)日：2019-01-22

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/21

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20170084422A1

公开(公告)日：2017-03-23

申请号：US15245911

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/06 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2804

Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

公开(公告)号：US11302511B2

公开(公告)日：2022-04-12

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US11120969B2

公开(公告)日：2021-09-14

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：US10325753B2

公开(公告)日：2019-06-18

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20190172675A1

公开(公告)日：2019-06-06

申请号：US16253106

申请日：2019-01-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/21

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20170084423A1

公开(公告)日：2017-03-23

申请号：US15267223

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/2817

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

公开(公告)号：US10861671B2

公开(公告)日：2020-12-08

申请号：US16253106

申请日：2019-01-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  G02B21/20

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US20200227232A1

公开(公告)日：2020-07-16

申请号：US16832973

申请日：2020-03-27

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/203 ,  H01J37/10

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.