Invention Grant
- Patent Title: Storage element and memory
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Application No.: US16654596Application Date: 2019-10-16
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Publication No.: US10862024B2Publication Date: 2020-12-08
- Inventor: Yutaka Higo , Masanori Hosomi , Hiroyuki Ohmori , Tetsuya Yamamoto , Kazutaka Yamane , Yuki Oishi , Hiroshi Kano
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2006-335016 20061212
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01F10/32 ; H01F41/32 ; B82Y25/00 ; H01L43/08 ; G11C11/16 ; H01L43/02 ; H01L27/22

Abstract:
A storage element includes a storage layer, a fixed magnetization layer, a spin barrier layer, and a spin absorption layer. The storage layer stores information based on a magnetization state of a magnetic material. The fixed magnetization layer is provided for the storage layer through a tunnel insulating layer. The spin barrier layer suppresses diffusion of spin-polarized electrons and is provided on the side of the storage layer opposite the fixed magnetization layer. The spin absorption layer is formed of a nonmagnetic metal layer causing spin pumping and provided on the side of the spin barrier layer opposite the storage layer. A direction of magnetization in the storage layer is changed by passing current in a layering direction to inject spin-polarized electrons so that information is recorded in the storage layer and the spin barrier layer includes at least a material selected from oxides, nitrides, and fluorides.
Public/Granted literature
- US20200052195A1 STORAGE ELEMENT AND MEMORY Public/Granted day:2020-02-13
Information query
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