Invention Grant
- Patent Title: Ferromagnetic multilayer film, magnetoresistance effect element, and method for manufacturing ferromagnetic multilayer film
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Application No.: US16794927Application Date: 2020-02-19
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Publication No.: US10884078B2Publication Date: 2021-01-05
- Inventor: Tomoyuki Sasaki , Yoshitomo Tanaka
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2017-037245 20170228
- Main IPC: H01L43/10
- IPC: H01L43/10 ; G01R33/09 ; H01L43/02 ; H01L27/22 ; H01L43/08 ; G11C11/16 ; H01L21/8239 ; H01L43/06 ; H01L43/04 ; H01L41/20 ; H01L45/00 ; G11C13/00 ; H01F10/32 ; H01L43/12

Abstract:
A ferromagnetic multilayer film includes first and second magnetization fixed layers, first and second interposed layers, and a magnetic coupling layer. The magnetization fixed layers are antiferromagnetically coupled by exchange coupling via the interposed layers and the magnetic coupling layer. A main element of the magnetic coupling layer is Ru, Rh, or Ir. A main element of the first interposed layer is the same as that of the magnetic coupling layer. A main element of the second interposed layer is different from that of the magnetic coupling layer. A thickness of the first interposed layer is greater than or equal to 1.5 times and less than or equal to 3.2 times an atomic radius of the main element of the first interposed layer. A thickness of the second interposed layer is less than or equal to 1.5 times an atomic radius of the main element of the second interposed layer.
Information query
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