Invention Grant
- Patent Title: Substrate cleaning composition, substrate treating method, and substrate treating apparatus
-
Application No.: US16129089Application Date: 2018-09-12
-
Publication No.: US11004675B2Publication Date: 2021-05-11
- Inventor: Hae-Won Choi , Ki-Moon Kang , Kihoon Choi , Anton Koriakin , Chan Young Heo , Jaeseong Lee , Kwon Taek Lim , Yong Hun Kim , Sang Ho Lee
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0117829 20170914,KR10-2018-0106336 20180906
- Main IPC: C11D7/36
- IPC: C11D7/36 ; H01L21/02 ; B08B3/08 ; C09K13/08 ; H01L21/67 ; C11D7/34 ; C11D11/00 ; H01L21/687 ; C11D7/50
Abstract:
Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.
Public/Granted literature
- US20190080902A1 SUBSTRATE CLEANING COMPOSITION, SUBSTRATE TREATING METHOD, AND SUBSTRATE TREATING APPARATUS Public/Granted day:2019-03-14
Information query
