公开(公告)号：US11130985B2

公开(公告)日：2021-09-28

申请号：US15529122

申请日：2015-10-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Naoshi Itabashi ,  Sonoko Migitaka ,  Masatoshi Narahara ,  Tomohiro Shoji ,  Yukio Ono

IPC: C12Q1/68 ,  C12Q1/6809 ,  B01J19/00 ,  C12Q1/6806 ,  C12Q1/6874 ,  G01N35/00 ,  G01N35/10 ,  B32B27/32 ,  C08G77/50

Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.