Invention Grant
- Patent Title: Photolithography device having illuminator and method for adjusting intensity uniformity
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Application No.: US16891067Application Date: 2020-06-03
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Publication No.: US11360392B2Publication Date: 2022-06-14
- Inventor: Che-Chang Hsu , Chieh-Jen Cheng , Li-Jui Chen , Shang-Chieh Chien , Chao-Chen Chang , Ssu-Yu Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027
Abstract:
An illuminator includes a first facet mirror receiving and reflecting an exposure radiation, an adjustable shielding element disposed on the first facet mirror, the adjustable shielding element adjusting intensity uniformity of the exposure radiation reflected by the first facet mirror, and a second facet mirror receiving and reflecting the exposure radiation reflected by the first facet mirror.
Public/Granted literature
- US20210033982A1 PHOTOGRAPHY DEVICE HAVING ILLUMINATOR AND METHOD FOR ADJUSTING INTENSITY UNIFORMITY Public/Granted day:2021-02-04
Information query
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