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    Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
    1.
    发明授权
    Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source 有权

    公开(公告)号：US10747119B2

    公开(公告)日：2020-08-18

    申请号：US16568044

    申请日：2019-09-11

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Yu-Chih Huang ,  Chi Yang ,  Che-Chang Hsu ,  Li-Jui Chen ,  Po-Chung Cheng

    IPC: G03B27/54 ,  G03F7/20

    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.

    Method and apparatus for lithography in semiconductor fabrication
    2.
    发明授权
    Method and apparatus for lithography in semiconductor fabrication 有权

    公开(公告)号：US11121018B2

    公开(公告)日：2021-09-14

    申请号：US16926935

    申请日：2020-07-13

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chueh-Chi Kuo ,  Tsung-Yen Lee ,  Chia-Hsin Chou ,  Tzung-Chi Fu ,  Li-Jui Chen ,  Po-Chung Cheng ,  Che-Chang Hsu

    IPC: G03F1/24 ,  H01L21/683 ,  G03F7/20

    Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.

    Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
    3.
    发明授权
    Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source 有权

    公开(公告)号：US11204556B2

    公开(公告)日：2021-12-21

    申请号：US16995759

    申请日：2020-08-17

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Yu-Chih Huang ,  Chi Yang ,  Che-Chang Hsu ,  Li-Jui Chen ,  Po-Chung Cheng

    IPC: G03F7/20

    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.

    Radiation source apparatus
    4.
    发明授权
    Radiation source apparatus 有权

    公开(公告)号：US10791616B1

    公开(公告)日：2020-09-29

    申请号：US16365905

    申请日：2019-03-27

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Ssu-Yu Chen ,  Chi Yang ,  Che-Chang Hsu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Po-Chung Cheng

    IPC: H05G2/00 ,  G03F1/58 ,  G03F7/20 ,  G03F1/24

    Abstract: A radiation source apparatus includes a vessel, a laser, a collector, a container, and a cone structure. The vessel has an exit aperture. The laser is at one end of the vessel and configured to excite a target material to form a plasma. The collector is in the vessel and configured to collect at least radiation of a desired wavelength emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The container is configured to receive a residue of the plasma. The cone structure is between the collector and the exit aperture and located besides the container. The cone structure includes a first inner sidewall, and a second inner sidewall adjoining the first inner sidewall and closer to the container than the first inner sidewall, and a first baffle assembly on the first inner sidewall.

    Extreme ultraviolet lithography system
    5.
    发明授权
    Extreme ultraviolet lithography system 有权

    公开(公告)号：US11086237B2

    公开(公告)日：2021-08-10

    申请号：US16805861

    申请日：2020-03-02

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Ssu-Yu Chen ,  Po-Chung Cheng ,  Li-Jui Chen ,  Che-Chang Hsu ,  Chi Yang

    IPC: G03F7/20

    Abstract: An extreme ultraviolet (EUV) lithography system includes a vane bucket module. The vane bucket module includes a collecting tank and a temperature adjusting pack. The collecting tank has a cover and the cover includes a plurality of through holes. Thicknesses of edges of the cover is greater than a thickness of a center of the cover. The temperature adjusting pack surrounds the collecting tank. The temperature adjusting pack includes a plurality of inlets aligned with the through holes.

    EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
    9.
    发明申请
    EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM 有权

    公开(公告)号：US20210033983A1

    公开(公告)日：2021-02-04

    申请号：US16805861

    申请日：2020-03-02

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Ssu-Yu Chen ,  Po-Chung Cheng ,  Li-Jui Chen ,  Che-Chang Hsu ,  Chi Yang

    IPC: G03F7/20

    Abstract: An extreme ultraviolet (EUV) lithography system includes a vane bucket module. The vane bucket module includes a collecting tank and a temperature adjusting pack. The collecting tank has a cover and the cover includes a plurality of through holes. Thicknesses of edges of the cover is greater than a thickness of a center of the cover. The temperature adjusting pack surrounds the collecting tank. The temperature adjusting pack includes a plurality of inlets aligned with the through holes.

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