Invention Grant
- Patent Title: Solution supply apparatus and solution supply method
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Application No.: US16768216Application Date: 2018-12-07
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Publication No.: US11433420B2Publication Date: 2022-09-06
- Inventor: Ryouichirou Naitou , Masato Hayashi , Hideo Shite , Hiroyuki Ide , Yosuke Kameda , Seiya Totsuka , Atsumu Maita , Takami Satoh , Hirofumi Araki , Kentaro Yoshihara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JPJP2017-237555 20171212,JPJP2018-227332 20181204
- International Application: PCT/JP2018/045152 WO 20181207
- International Announcement: WO2019/117043 WO 20190620
- Main IPC: B05C19/06
- IPC: B05C19/06 ; B05C11/10 ; H01L21/67

Abstract:
A solution supply apparatus is for supplying a treatment solution to a treatment solution discharger which discharges the treatment solution to a treatment object. The solution supply apparatus includes: a supply pipe line connected to the treatment solution discharger; a filter provided on the supply pipe line which filters the treatment solution to remove foreign substances; and a controller. The controller performs a determination of a state of the treatment solution to be supplied to a primary side of the filter and, when the state of the treatment solution is determined to be bad, outputs a control signal for restricting supply of the treatment solution to the primary side of the filter.
Public/Granted literature
- US20200290080A1 SOLUTION SUPPLY APPARATUS AND SOLUTION SUPPLY METHOD Public/Granted day:2020-09-17
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