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公开(公告)号:US11433420B2
公开(公告)日:2022-09-06
申请号:US16768216
申请日:2018-12-07
Applicant: Tokyo Electron Limited
Inventor: Ryouichirou Naitou , Masato Hayashi , Hideo Shite , Hiroyuki Ide , Yosuke Kameda , Seiya Totsuka , Atsumu Maita , Takami Satoh , Hirofumi Araki , Kentaro Yoshihara
Abstract: A solution supply apparatus is for supplying a treatment solution to a treatment solution discharger which discharges the treatment solution to a treatment object. The solution supply apparatus includes: a supply pipe line connected to the treatment solution discharger; a filter provided on the supply pipe line which filters the treatment solution to remove foreign substances; and a controller. The controller performs a determination of a state of the treatment solution to be supplied to a primary side of the filter and, when the state of the treatment solution is determined to be bad, outputs a control signal for restricting supply of the treatment solution to the primary side of the filter.