- Patent Title: Composition, film, near infrared cut filter, laminate, pattern forming method, solid image pickup element, image display device, infrared sensor, and color filter
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Application No.: US17157195Application Date: 2021-01-25
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Publication No.: US11518833B2Publication Date: 2022-12-06
- Inventor: Tokihiko Matsumura , Daisuke Sasaki , Kyohei Arayama , Yoshihiro Jimbo , Kazuya Oota , Keisuke Arimura , Takahiro Okawara
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2016-015782 20160129,JPJP2016-142116 20160720,JPJP2016-228784 20161125
- Main IPC: C08F220/18
- IPC: C08F220/18 ; C08F2/48 ; C08K5/55 ; C08L33/10 ; C09B23/01 ; C09B23/08 ; C09B23/14 ; C09B57/00 ; G02B5/20 ; G02B5/22 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; H01L27/146 ; H01L27/148 ; G03F7/00 ; G03F7/027 ; G03F7/031 ; G03F7/075 ; C08F220/14 ; C08K5/00 ; C08K5/3415 ; C09B23/00 ; C09K3/00 ; G03F7/033
Abstract:
A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
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