Invention Grant
- Patent Title: Stack comprising single-crystal diamond substrate
-
Application No.: US16962203Application Date: 2019-01-11
-
Publication No.: US11522055B2Publication Date: 2022-12-06
- Inventor: Shinya Ohmagari , Hideaki Yamada , Hitoshi Umezawa , Nobuteru Tsubouchi , Akiyoshi Chayahara , Yoshiaki Mokuno , Akinori Seki , Fumiaki Kawai , Hiroaki Saitoh
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JPJP2018-004027 20180115
- International Application: PCT/JP2019/000772 WO 20190111
- International Announcement: WO2019/139147 WO 20190718
- Main IPC: H01L29/16
- IPC: H01L29/16 ; C23C16/01 ; C23C16/27 ; C30B25/20 ; C30B29/04 ; H01L21/02 ; H01L29/66 ; H01L29/872

Abstract:
A stack including at least a semiconductor drift layer stacked on a single-crystal diamond substrate having a coalescence boundary, wherein the coalescence boundary of the single-crystal diamond substrate is a region that exhibits, in a Raman spectrum at a laser excitation wavelength of 785 nm, a full width at half maximum of a peak near 1332 cm−1 due to diamond that is observed to be broader than a full width at half maximum of the peak exhibited by a region different from the coalescence boundary, the coalescence boundary has a width of 200 μm or more, and the semiconductor drift layer is stacked on at least the coalescence boundary.
Public/Granted literature
- US20210066078A1 STACK COMPRISING SINGLE-CRYSTAL DIAMOND SUBSTRATE Public/Granted day:2021-03-04
Information query
IPC分类: