Invention Grant
- Patent Title: High electron mobility transistor
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Application No.: US17386729Application Date: 2021-07-28
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Publication No.: US11588046B2Publication Date: 2023-02-21
- Inventor: Dongchul Shin , Boram Kim , Younghwan Park , Jongseob Kim , Joonyong Kim , Junhyuk Park , Jaejoon Oh , Minchul Yu , Soogine Chong , Sunkyu Hwang , Injun Hwang
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2021-0040540 20210329
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/205 ; H01L29/20

Abstract:
A high electron mobility transistor (HEMT) includes a channel layer, a plurality of barrier layers, and a p-type semiconductor layer. The barrier layers have an energy band gap greater than that of the channel layer. A gate electrode is arranged on the p-type semiconductor layer. A source electrode and a drain electrode are apart from the p-type semiconductor layer and the gate electrode on the barrier layers. Impurity concentrations of the barrier layers are different from each other in a drift area between the source electrode and the drain electrode.
Public/Granted literature
- US20220310833A1 HIGH ELECTRON MOBILITY TRANSISTOR Public/Granted day:2022-09-29
Information query
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