发明授权
- 专利标题: Selective deposition of embedded thin-film resistors for semiconductor packaging
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申请号: US16129711申请日: 2018-09-12
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公开(公告)号: US11728265B2公开(公告)日: 2023-08-15
- 发明人: Brandon C. Marin , Frank Truong , Shivasubramanian Balasubramanian , Dilan Seneviratne , Yonggang Li , Sameer Paital , Darko Grujicic , Rengarajan Shanmugam , Melissa Wette , Srinivas Pietambaram
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwabe, Williamson & Wyatt P.C.
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/48 ; H01L23/522 ; H01L49/02 ; H01L21/768 ; H01L23/00 ; H01L27/01 ; H01L23/64
摘要:
Embodiments include package substrates and a method of forming the package substrates. A package substrate includes a dielectric having a cavity that has a footprint, a resistor embedded in the cavity of the dielectric, and a plurality of traces on the resistor, where a plurality of surfaces of the resistor are activated surfaces. The resistor may also have a plurality of sidewalls which may be activated sidewalls and tapered. The dielectric may include metallization particles/ions. The resistor may include resistive materials, such as nickel-phosphorus (NiP), aluminum-nitride (AlN), and/or titanium-nitride (TiN). The package substrate may further include a first resistor embedded adjacently to the resistor. The first resistor may have a first footprint of a first cavity that is different than the footprint of the cavity of the resistor. The resistor may have a resistance value that is thus different than a first resistance value of the first resistor.
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