Invention Grant
- Patent Title: Selective deposition of embedded thin-film resistors for semiconductor packaging
-
Application No.: US16129711Application Date: 2018-09-12
-
Publication No.: US11728265B2Publication Date: 2023-08-15
- Inventor: Brandon C. Marin , Frank Truong , Shivasubramanian Balasubramanian , Dilan Seneviratne , Yonggang Li , Sameer Paital , Darko Grujicic , Rengarajan Shanmugam , Melissa Wette , Srinivas Pietambaram
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt P.C.
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/48 ; H01L23/522 ; H01L49/02 ; H01L21/768 ; H01L23/00 ; H01L27/01 ; H01L23/64

Abstract:
Embodiments include package substrates and a method of forming the package substrates. A package substrate includes a dielectric having a cavity that has a footprint, a resistor embedded in the cavity of the dielectric, and a plurality of traces on the resistor, where a plurality of surfaces of the resistor are activated surfaces. The resistor may also have a plurality of sidewalls which may be activated sidewalls and tapered. The dielectric may include metallization particles/ions. The resistor may include resistive materials, such as nickel-phosphorus (NiP), aluminum-nitride (AlN), and/or titanium-nitride (TiN). The package substrate may further include a first resistor embedded adjacently to the resistor. The first resistor may have a first footprint of a first cavity that is different than the footprint of the cavity of the resistor. The resistor may have a resistance value that is thus different than a first resistance value of the first resistor.
Public/Granted literature
- US20200083164A1 SELECTIVE DEPOSITION OF EMBEDDED THIN-FILM RESISTORS FOR SEMICONDUCTOR PACKAGING Public/Granted day:2020-03-12
Information query
IPC分类: