Invention Grant
- Patent Title: Polishing compositions and methods of use thereof
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Application No.: US17063965Application Date: 2020-10-06
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Publication No.: US11732157B2Publication Date: 2023-08-22
- Inventor: Yannan Liang , Bin Hu , Liqing Wen , Shu-Wei Chang
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C09G1/02
- IPC: C09G1/02 ; H01L21/321 ; B24B1/00 ; C09K3/14 ; C09G1/00 ; C09K13/06 ; C09G1/04 ; C09G1/06 ; B24B37/04 ; H01L21/306
Abstract:
A polishing composition includes an abrasive; an optional pH adjuster; a barrier film removal rate enhancer; a TEOS removal rate inhibitor; a cobalt removal rate enhancer; an azole-containing corrosion inhibitor; and a cobalt corrosion inhibitor.
Public/Granted literature
- US20210108106A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF Public/Granted day:2021-04-15
Information query
