Invention Grant
- Patent Title: Methods for reflector film growth
-
Application No.: US16819023Application Date: 2020-03-13
-
Publication No.: US11776980B2Publication Date: 2023-10-03
- Inventor: Luping Li , Jacqueline S. Wrench , Wen Ting Chen , Yixiong Yang , In Seok Hwang , Shih Chung Chen , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L27/146
- IPC: H01L27/146 ; C23C16/20 ; C23C16/14 ; C23C16/455 ; H01L21/67
Abstract:
Methods and apparatus for forming reflector films are described A liner is formed on a substrate surface followed by formation of the reflector layer so that there is no oxygen exposure between liner and reflector layer formation. In some embodiments, a high aspect ratio structure is filled with a reflector material by partially filling the structure with the reflector material while growth is inhibited at a top portion of the structure, reactivating the top portion of the substrate and then filling the structure with the reflector material.
Public/Granted literature
- US20210288086A1 METHODS FOR REFLECTOR FILM GROWTH Public/Granted day:2021-09-16
Information query
IPC分类:
