A method for processing an integrated circuit includes forming I/O gate all around transistors and core gate all around transistors. The method performs a regrowth process on an interfacial dielectric layer of the I/O gate all around transistors by diffusing metal atoms into the interfacial dielectric layer of the I/O gate all around transistor. The regrowth process does not diffuse metal atoms into the interfacial gate dielectric layer of the core gate all around transistor.