Invention Application
- Patent Title: Method of removing an amorphous oxide from a monocrystalline surface
- Patent Title (中): 从单晶表面除去无定形氧化物的方法
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Application No.: US09983854Application Date: 2001-10-26
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Publication No.: US20020072253A1Publication Date: 2002-06-13
- Inventor: John L. Edwards JR. , Yi Wei , Dirk C. Jordan , Xiaoming Hu , James Bradley Craigo , Ravindranath Droopad , Zhiyi Yu , Alexander A. Demkov
- Applicant: MOTOROLA, INC.
- Applicant Address: IL Schaumburg
- Assignee: MOTOROLA, INC.
- Current Assignee: MOTOROLA, INC.
- Current Assignee Address: IL Schaumburg
- Main IPC: H01L021/26
- IPC: H01L021/26 ; H01L021/324 ; H01L021/302 ; H01L021/42 ; H01L021/477 ; H01L021/461
Abstract:
A method of removing an amorphous oxide from a surface of a monocrystalline substrate is provided. The method includes depositing a passivation material overlying the amorphous oxide. The monocrystalline substrate is then heated so that the amorphous oxide layer decomposes into at least one volatile species that is liberated from the surface.
Public/Granted literature
- US06693033B2 Method of removing an amorphous oxide from a monocrystalline surface Public/Granted day:2004-02-17
Information query
