发明申请
US20050145865A1 Semiconductor light emitting element and method for manufacturing same, integrated semiconductor light-emitting device and method for manufacturing same, image display and method for manufacturing same, and illuminating device and method for manufacturing same
失效
半导体发光元件及其制造方法,集成半导体发光器件及其制造方法,图像显示及其制造方法以及照明装置及其制造方法
- 专利标题: Semiconductor light emitting element and method for manufacturing same, integrated semiconductor light-emitting device and method for manufacturing same, image display and method for manufacturing same, and illuminating device and method for manufacturing same
- 专利标题(中): 半导体发光元件及其制造方法,集成半导体发光器件及其制造方法,图像显示及其制造方法以及照明装置及其制造方法
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申请号: US10512131申请日: 2004-02-19
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公开(公告)号: US20050145865A1公开(公告)日: 2005-07-07
- 发明人: Hiroyuki Okuyama , Masato Doi , Goshi Biwa , Jun Suzuki , Toyoharu Oohata
- 申请人: Hiroyuki Okuyama , Masato Doi , Goshi Biwa , Jun Suzuki , Toyoharu Oohata
- 优先权: JP2003-077703 20030320
- 国际申请: PCT/JP04/01952 WO 20040219
- 主分类号: C23C16/34
- IPC分类号: C23C16/34 ; C02F1/24 ; H01L21/28 ; H01L33/08 ; H01L33/16 ; H01L33/32 ; H01L33/00
摘要:
A semiconductor light emitting element, manufacturing method thereof, integrated semiconductor light emitting device, manufacturing method thereof, illuminating device, and manufacturing method thereof are provided. An n-type GaN layer is grown on a sapphire substrate, and a growth mask of SiN, for example, is formed thereon. On the n-type GaN layer exposed through an opening in the growth mask, a six-sided steeple-shaped n-type GaN layer is selectively grown, which has inclined crystal planes each composed of a plurality of crystal planes inclined from the major surface of the sapphire substrate by different angles of inclination to exhibit a convex plane as a whole. On the n-type GaN layer, an active layer and a p-type GaN layer are grown to make a light emitting element structure. Thereafter, a p-side electrode and an n-side electrode are formed.
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