发明申请
US20050271109A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SYSTEM
有权
非常窄带,两个室,高倍率气体放电激光系统
- 专利标题: VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SYSTEM
- 专利标题(中): 非常窄带,两个室,高倍率气体放电激光系统
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申请号: US11199691申请日: 2005-08-09
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公开(公告)号: US20050271109A1公开(公告)日: 2005-12-08
- 发明人: David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
- 申请人: David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
- 申请人地址: US CA San Diego 92127
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego 92127
- 主分类号: H01S1/00
- IPC分类号: H01S1/00 ; G01J1/42 ; G01J9/00 ; G03F7/20 ; H01S3/00 ; H01S3/03 ; H01S3/036 ; H01S3/038 ; H01S3/04 ; H01S3/041 ; H01S3/08 ; H01S3/0943 ; H01S3/097 ; H01S3/0971 ; H01S3/0975 ; H01S3/102 ; H01S3/104 ; H01S3/105 ; H01S3/1055 ; H01S3/11 ; H01S3/13 ; H01S3/131 ; H01S3/134 ; H01S3/137 ; H01S3/139 ; H01S3/22 ; H01S3/223 ; H01S3/225 ; H01S3/23
摘要:
An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.
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