公开(公告)号：US20060227839A1

公开(公告)日：2006-10-12

申请号：US11095293

申请日：2005-03-31

申请人： Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

发明人： Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

IPC分类号： H01S3/22

CPC分类号： H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

摘要翻译： 公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，第一个电极，激光介质气体，第二个电极，电流返回路径和第二个端子，形成具有特定头电流电感槽独有的电感的头电流感应回路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

公开(公告)号：US20060131515A1

公开(公告)日：2006-06-22

申请号：US10798740

申请日：2004-03-10

申请人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

发明人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

IPC分类号： G01J1/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

公开(公告)号：US08993976B2

公开(公告)日：2015-03-31

申请号：US13249504

申请日：2011-09-30

申请人： Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

发明人： Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

IPC分类号： G01J1/42 ,  G03F7/20 ,  H05G2/00 ,  G01J1/16

CPC分类号： G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.

摘要翻译： 一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有目标材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲光束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。 控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

公开(公告)号：US20080023657A1

公开(公告)日：2008-01-31

申请号：US11880319

申请日：2007-07-20

申请人： Stephen Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

发明人： Stephen Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

IPC分类号： H01L31/18

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

公开(公告)号：US20070158596A1

公开(公告)日：2007-07-12

申请号：US11647007

申请日：2006-12-27

申请人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

发明人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

公开(公告)号：US20070114468A1

公开(公告)日：2007-05-24

申请号：US11603471

申请日：2006-11-21

申请人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

发明人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

IPC分类号： G01J3/10

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

摘要： An apparatus/method is disclosed that may conmprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light source; a debris shield intermediate the plasma initiation point and the elliptical collector mirror comprising a plurality of radially extending channels extending from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the elliptical collector mirror. The plurality of channels may be formed between a plurality of generally planer foils extending radially from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the collector mirror.

摘要翻译： 公开了一种可以包括可以包括收集器的EUV光源的装置/方法，该收集器可以包括在EUV光源的中间焦点处的等离子体起始点处的第一焦点和具有第一焦点的椭圆形集光镜; 位于等离子体起始点之间的碎片屏蔽和椭圆形收集器镜，其包括从第一焦点延伸并对准到第二焦点并围绕穿过第一焦点的旋转轴对称的多个径向延伸的通道，并且对准纵向轴线 的椭圆收集镜。 多个通道可以形成在从第一焦点径向延伸并与第二焦点对准的多个大致平面的箔片之间并且围绕穿过第一焦点的旋转轴线对称并且与收集器反射镜的纵向轴线对准。

公开(公告)号：US20070029511A1

公开(公告)日：2007-02-08

申请号：US11471258

申请日：2006-06-20

申请人： Robert Akins ,  Richard Sandstrom ,  William Partlo ,  Igor Fomenkov

发明人： Robert Akins ,  Richard Sandstrom ,  William Partlo ,  Igor Fomenkov

IPC分类号： G01J3/10

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

公开(公告)号：US20070023705A1

公开(公告)日：2007-02-01

申请号：US11168190

申请日：2005-06-27

申请人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov ,  Oleh Khodykin

发明人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov ,  Oleh Khodykin

IPC分类号： G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  H05G2/005

摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

摘要翻译： 一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物 收集器光学元件上的材料化合物。 该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物 可能被确定为有效。 延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

公开(公告)号：US20070008517A1

公开(公告)日：2007-01-11

申请号：US11177501

申请日：2005-07-08

申请人： Igor Fomenkov ,  Norbert Bowering ,  Jerzy Hoffman

发明人： Igor Fomenkov ,  Norbert Bowering ,  Jerzy Hoffman

IPC分类号： G01J1/42

CPC分类号： G03F7/7085 ,  B82Y10/00 ,  G21K2201/061

摘要： Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi2/Si multi-layer mirror.

摘要翻译： 披露了EUV光源计量系统和方法。 在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路设置的光电子源材料，以暴露材料并产生一定量的光电子。 该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。 在另一方面，用于测量EUV光强度的系统可以包括多层反射镜，例如Mo / Si，沿着EUV光路径可弃，以暴露反射镜并在反射镜中产生光电流。 电流监视器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。 在另一方面，离线EUV测量系统可以包括用于测量光特性和MoSi 2 / Si多层反射镜的仪器。

公开(公告)号：US20070001131A1

公开(公告)日：2007-01-04

申请号：US11174299

申请日：2005-06-29

申请人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

发明人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

IPC分类号： G01J1/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下 聚焦镜头。 驱动激光器可以包括CO 2激光器。 驱动激光重定向机构可以包括镜子。