Invention Application
- Patent Title: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING PURIFIED BLOCK COPOLYMERS AND SEMICONDUCTOR DEVICES
- Patent Title (中): 使用纯化嵌段共聚物和半导体器件制造半导体器件的方法
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Application No.: US14511191Application Date: 2014-10-10
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Publication No.: US20150162195A1Publication Date: 2015-06-11
- Inventor: Jun Won HAN , Su-Jin KWON , Hye-Ryun KIM , Jae-Hyun KIM , Jung-Sik CHOI
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2013-0151342 20131206
- Main IPC: H01L21/033
- IPC: H01L21/033 ; H01L21/311 ; H01L21/768 ; C08L53/00
Abstract:
In a method of manufacturing a semiconductor device, a blend solution that includes a block copolymer and an adsorbent is prepared. The block copolymer is synthesized by a copolymerization between a first polymer unit and a second polymer unit having a hydrophilicity greater than that of the first polymer unit. The adsorbent on which the block copolymer is adsorbed is extracted. The block copolymer is separated from the adsorbent. The block copolymer is collected. The block copolymer may be used to form a mask on an object layer on a substrate and the mask used to etch the object layer.
Public/Granted literature
- US09627205B2 Method of manufacturing a semiconductor device using purified block copolymers and semiconductor devices Public/Granted day:2017-04-18
Information query
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